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20 March 2019 SRAF rule extraction and insertion based on inverse lithography technology
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Abstract
The placement and size of SRAF (sub-resolution assisted feature) can greatly affect the overlapped process window. The time-consuming inverse lithography technology (ILT) can provide the co-optimization for both main pattern and SRAFs, which can guarantee the results with high precision. Rule-based SRAF (RBSRAF) offers the efficient application in large scale layout, which relies mostly on the design of test patterns and the corresponding empirical data on wafer. Our paper demonstrates a methodology of SRAF rule extraction and insertion based on ILT. The SRAF rules are extracted from the results of ILT and inserted by the RBSRAF, which ensures the reliability of the SRAF rules and shortens the development cycle. The hotspots areas with substandard process variation (PV) band are then repaired by ILT tools. Besides, the SRAF printing model can further refine the placement and dimension. The experiment results validate the feasibility of our methodology to be applied in large scale layout finally.
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Xiaojing Su, Pengzheng Gao, Yayi Wei, and Weijie Shi "SRAF rule extraction and insertion based on inverse lithography technology", Proc. SPIE 10961, Optical Microlithography XXXII, 109610P (20 March 2019); https://doi.org/10.1117/12.2511914
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