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Fabrication challenges and opportunities for high-mobility materials: from CMOS applications to emerging derivative technologies
SPARC: a novel technology for depositing conformal dielectric thin films with compositional tuning for etch selectivity
EUV line-space pattern defect mitigation simulation using Coventor SEMulator3D to enable exposure dose reduction
Enabling complimentary FET (CFET) fabrication: selective, isotropic etch of Group IV semiconductors (Conference Presentation)
Ultrahigh selective etching of Si3N4 over SiO2 using plasma-less dry process for 3D-NAND device applications
Virtual fabrication and advanced process control improve yield for SAQP process assessment with 16 nm half-pitch
Blazed x-ray reflection gratings using electron-beam lithography and ion milling (Conference Presentation)