Abstract
This PDF contains the front matter associated with SPIE Proceedings Volume 10991, including the title page, copyright information, table of contents, and author and committee lists.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Dimensional Optical Metrology and Inspection for Practical Applications VIII, edited by Kevin G. Harding, Song Zhang, Proceedings of SPIE Vol. 10991 (SPIE, Bellingham, WA, 2019) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510626478

ISBN: 9781510626485 (electronic)

Published by

SPIE

P.O. Box 10, Bellingham, Washington 98227-0010 USA

Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445

SPIE.org

Copyright © 2019, Society of Photo-Optical Instrumentation Engineers.

Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/19/$18.00.

Printed in the United States of America by Curran Associates, Inc., under license from SPIE.

Publication of record for individual papers is online in the SPIE Digital Library.

00003_PSISDG10991_1099101_page_2_1.jpg

Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Alberts, Gabriel, 0R

Aloisi, Valentina, 0R

Altamar-Mercado, Hernando, 04

Barcelata-Pinzón, A., 0F

Brahm, Anika, 0H

Bräuer-Burchardt, Christian, 0K

Breitbarth, Andreas, 0H

Centamore, Allison A., 0U

Chen, Qian, 0D

Chiu, Harry, 0S

Dietrich, Patrick, 09, 0O

Feng, Shijie, 0D

Finney, Greg A., 0U

Gao, Nan, 0A

Gebhart, Ingo, 0O

Grosmann, Pascal, 09

Harding, Kevin, 0L, 0S, 0X

Heinze, Matthias, 0K

Heist, Stefan, 09, 0J, 0O

Kim, Felix, 0R

Kodgirwar, Shantanu P., 0K

Kühmstedt, Peter, 09, 0J, 0K, 0O

Landmann, Martin, 09, 0J, 0O

Lee, Vincent, 0R

Li, Beiwen, 08, 0I, 0M

Li, Shaoliang, 05

Libbey, Brad, 0N

Liu, Xiaohong, 0A

Lutzke, Peter, 09, 0O

Marrugo, Andrés G., 02, 04

Marrugo, Javier, 04

Meneses, Jaime, 02, 04

Meneses-Fabian, C., 0F

Munkelt, Christoph, 0K

Muralikrishnan, Bala, 06, 0R

Nehmetallah, George, 0N

Niu, Zhenqi, 05

Notni, Gunther, 09, 0H, 0J, 0K, 0O

Perea, James, 0N

Persons, Christopher M., 0U

Phillips, Steve, 0R

Pineda, Jesus, 04

Rachakonda, Prem, 06

Ramamurthy, Rajesh, 0S

Ren, Wei, 0R

Romero, Lenny A., 02, 04

Rosenberger, Maik, 0H

Sawyer, Daniel, 06

Shilling, Meghan, 0R

Steglich, Martin, 0J

Suresh, Vignesh, 08, 0M

Tait, Robert, 0S

Tao, Tianyang, 0D

Templin, Joachim, 0O

Trevithick, Caleb P. M., 0U

Vargas, Raúl, 04

Wang, Yajun, 08, 0I, 0M

Whitten, Jacob R., 0U

Xu, Xueyang, 05

Yin, Wei, 0D

Zhang, Chen, 0H

Zhang, Xiangchao, 05

Zhang, Yueqian, 0J

Zhang, Zonghua, 0A

Zhao, Wanliang, 05

Zheng, Yi, 0I, 0M

Zuo, Chao, 0D

Conference Committee

Symposium Chairs

  • Jay Kumler, JENOPTIK Optical Systems, LLC (United States)

  • Ruth Moser, Air Force Research Laboratory (United States)

Symposium Co-chair

  • John Pellegrino, Electro-Optical Systems Laboratory, Georgia Institute of Technology (United States)

Conference Chairs

  • Kevin G. Harding, Optical Metrology Solutions (United States)

  • Song Zhang, Purdue University (United States)

Conference Program Committee

  • Nikola Dudukovic, Lawrence Livermore National Laboratory (United States)

  • Greg A. Finney, IERUS Technologies, Inc. (United States)

  • Jason C. Fox, National Institute of Standards and Technology (United States)

  • Motoharu Fujigaki, University of Fukui (Japan)

  • Steven E. Grantham, National Institute of Standards and Technology (United States)

  • Stefan Heist, Friedrich-Schiller-Universität Jena (Germany)

  • Aravinda Kar, CREOL, The College of Optics and Photonics, University of Central Florida (United States)

  • Damien P. Kelly, Technische Universität Ilmenau (Germany)

  • Chris Koontz, Raytheon Company (United States)

  • Peter Kühmstedt, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)

  • Martin Landmann, Friedrich-Schiller-Universität Jena (Germany)

  • Rongguang Liang, College of Optical Sciences, The University of Arizona (United States)

  • Georges T. Nehmetallah, The Catholic University of America (United States)

  • Gunther Notni, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)

  • Kemao Qian, Nanyang Technological University (Singapore)

  • Rajesh Ramamurthy, GE Global Research (United States)

  • Edward W. Reutzel, Pennsylvania State University (United States)

  • Brian Simonds, National Institute of Standards and Technology (United States)

  • Lei Tian, Boston University (United States)

  • Yajun Wang, Wuhan University (China)

  • Zhaoyang Wang, The Catholic University of America (United States)

  • Daniel J. L. Williams, Quality Vision International, Inc. (United States)

  • Jiangtao Xi, University of Wollongong (Australia)

  • Jing Xu, Tsinghua University (China)

  • Dongmin Yang, Apple Inc. (United States)

  • Xiangchao Zhang, Fudan University (China)

  • Zonghua Zhang, Hebei University of Technology (China)

  • Aurora A. Zinck, Lockheed Martin (United States)

  • Chao Zuo, Nanjing University of Science and Technology (China)

Session Chairs

  • 1 3D Metrology Applications

    Song Zhang, Purdue University (United States)

  • 2 Metrology Analysis I

    Chao Zuo, Nanjing University of Science and Technology (China)

  • 3 Metrology Analysis II

    Yajun Wang, Wuhan University (China)

  • 4 3D Methods I

    Martin Landmann, Friedrich-Schiller-Universität Jena (Germany)

  • 5 3D Methods II

    Stefan Heist, Friedrich-Schiller-Universität Jena (Germany)

  • 6 3D Methods III

    Kevin G. Harding, Optical Metrology Solutions (United States)

  • 7 Metrology for Additive Manufacturing I

    Kevin G. Harding, Optical Metrology Solutions (United States)

  • 8 Metrology for Additive Manufacturing: Critical Technology Review

    Kevin G. Harding, Optical Metrology Solutions (United States)

© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 10991", Proc. SPIE 10991, Dimensional Optical Metrology and Inspection for Practical Applications VIII, 1099101 (19 July 2019); https://doi.org/10.1117/12.2536356
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
3D metrology

Metrology

3D image processing

3D printing

Optical metrology

Additive manufacturing

Error analysis

Back to Top