Improvements of the PLD (Pulsed Laser Deposition) method for fabricating photocathodes in ICMOS (Intensified CMOS) sensors

Dae-Hee Lee; Youngsik Park; Bongkon Moon; Yong-Woo Kang; Won-Kee Park; Seoung-Chul Bang; Hyeunseok Choi; Sung Bok Kang; Nikolay Vedenkin; Alexander Malyshev; Yang-Sook Kim

doi:10.1117/12.2524640

11 April 2019 Improvements of the PLD (Pulsed Laser Deposition) method for fabricating photocathodes in ICMOS (Intensified CMOS) sensors

Dae-Hee Lee, Youngsik Park, Bongkon Moon, Yong-Woo Kang, Won-Kee Park, Seoung-Chul Bang, Hyeunseok Choi, Sung Bok Kang, Nikolay Vedenkin, Alexander Malyshev, Yang-Sook Kim

Author Affiliations +

Proceedings Volume 11028, Optical Sensors 2019; 110282Y (2019) https://doi.org/10.1117/12.2524640
Event: SPIE Optics + Optoelectronics, 2019, Prague, Czech Republic

Abstract

We introduce new technologies improving the PLD (Pulsed Laser Deposition) method to fabricate visible (370 ~ 600 nm) and NUV (Near Ultraviolet, 185 ~ 320 nm) photocathodes for IIT (Image Intensifier Tube) sensors. The multi-purpose PLD VC (Vacuum Chamber) by utilizing optical window viewports and a couple of internal carousels can do the whole process of the laser deposition of various alkalis, including the measurement the QE (Quantum Efficiency) in-situ, for multiple photocathode targets. Then, we have integrated a Load/Degassing/Assembly (LDA) VC to the PLD VC, to prepare, load, degas, and assemble the alkali targets and the photocathode substrates. With these facilities, we have manufactured high QE photocathodes free from oxidation and water vapor contamination during the process. In this paper, we describe detail procedures of our new technologies to make S20 and CsTe photocathodes for visual and NUV wavelengths respectively, and discuss about the test results of the IIT products.

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Dae-Hee Lee, Youngsik Park, Bongkon Moon, Yong-Woo Kang, Won-Kee Park, Seoung-Chul Bang, Hyeunseok Choi, Sung Bok Kang, Nikolay Vedenkin, Alexander Malyshev, and Yang-Sook Kim "Improvements of the PLD (Pulsed Laser Deposition) method for fabricating photocathodes in ICMOS (Intensified CMOS) sensors", Proc. SPIE 11028, Optical Sensors 2019, 110282Y (11 April 2019); https://doi.org/10.1117/12.2524640

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