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29 January 2019 Ellipsometric study of thin carbon films deposited by pulsed laser deposition
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Proceedings Volume 11047, 20th International Conference and School on Quantum Electronics: Laser Physics and Applications; 110470N (2019) https://doi.org/10.1117/12.2516970
Event: International Conference and School on Quantum Electronics "Laser Physics and Applications": ICSQE 2018, 2018, Nessebar, Bulgaria
Abstract
The fabrication of nano-crystalline carbon films was implemented by the application of pulsed laser deposition (PLD) technology. The experiments were performed in a standard on-axis laser ablation (LA) configuration. The third harmonic of a Nd:YAG laser was used for ablation of a microcrystalline graphite target. All experiments were performed in vacuum at a pressure of 1×10-3 Pa for different deposition times. (001) Oriented silicon (Si) covered by either 350 or 450 nm silica (SiO2) layer was used as a substrate. The films have a thickness between 4 and 40 nm and are characterized by X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, atomic force microscopy (AFM) and ellipsometry measurements. We established deposition of nano-sized graphene-like films on top of predominantly amorphous carbon films with a thickness of 1- 2 nm. The measured the (n and k) and determined the values for the forbidden gap of the films which are between 0.01 eV and about 1 eV with reference to the sp3 hybridized carbon content of the film.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Dikovska, L. Tzonev, I. Avramova, P. Terziiska, I. Bineva, G. Avdeev, E. Valcheva, J. Mladenoff, O. Angelov, S. Kolev, and T. Milenov "Ellipsometric study of thin carbon films deposited by pulsed laser deposition", Proc. SPIE 11047, 20th International Conference and School on Quantum Electronics: Laser Physics and Applications, 110470N (29 January 2019); https://doi.org/10.1117/12.2516970
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