Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 11056, including the Title Page, Copyright information, Table of Contents, Author and Conference Committee lists.

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Author(s), “Title of Paper,” in Optical Measurement Systems for Industrial Inspection XI, edited by Peter Lehmann, Wolfgang Osten, Armando Albertazzi Gonçalves Jr., Proceedings of SPIE Vol. 11056 (SPIE, Bellingham, WA, 2019) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510627918

ISBN: 9781510627925 (electronic)

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Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Acher, Olivier, 2O

Aguirre-Aguirre, Daniel, 1O

Ahlers, K., 0S

Aichert, D., 3F

Aizu, Yoshihisa, 3G

Aketagawa, Masato, 0F

Albertazzi G., Armando, 0H, 21, 2N, 49

An, S. Y., 3J

Anisimov, Andrei G., 0J

Antoine, P., 19

Aoki, N., 3R

Arai, Y., 0B

Arstila, Timo, 0Q, 0S

Artigas, Roger, 0W

Ayubi, Gastón A., 45

Babovsky, Holger, 17

Bae, Jaeseok, 04, 1R

Bahr, Leo A., 1U

Bai, Qian, 2B

Baldo, Crhistian R., 2N

Barandak, A., 2K, 30

Baroud, Yousef, 13

Barrera, Estiven S., 0H, 21, 2N

Baselt, T., 1T

Batshev, Vladislav I., 2W, 3T

Beermann, Rüdiger, 14

Béguelin, Jeremy, 0Z

Beisswanger, Rolf, 1G

Belkner, Johannes, 11

Benedet, Mauro E., 0H, 21

Bermudez, Carlos, 0W

Berndt, Dirk, 48

Bertz, A., 0V

Besaga, Vira R., 2I

Binkele, Tobias, 1N

Birli, Oliver, 0L

Blain, P., 0G, 0I

Blalock, Todd, 1H

Blättermann, Alexander, 20

Blödorn, Rodrigo, 49

Blohm, Werner, 1B

Blug, A., 0V

Blumröder, Ulrike, 0L

Böhler, Mario, 1V

Boing, Denis, 49

Bolbasova, L. A., 3D

Boonen, Laura, 1Y

Borges, Vicente K., 2U

Borguet, B., 19

Bortoli, Tiago, 21

Boussemaere, L., 19

Bouwens, A., 19

Braeuer, Andreas S., 1U

Brand, Andreas A., 1V

Brandenburg, Albrecht, 1X, 20

Bräuer-Burchardt, Christian, 17

Budnev, A. Y., 3Z

Burada, Dali R., 47, 4B

Cadevall, Cristina, 0W

Cai, Zewei, 28

Cao, Chunyan, 2Q, 2S

Cao, Jinjin, 3L

Carl, D., 0V

Chang Chien, Kuang-Che, 06

Charrett, Thomas O. H., 0K, 3K

Chen, Hu, 2Q, 2S

Chen, Jian, 27, 2G

Chen, Liang-Chia, 11

Cheng, Chau-Jern, 06

Chertov, Aleksander N., 2V

Claussen, Gunnar, 1B

Clermont, L., 1D

Coggrave, Charles R., 07

Cornejo-Rodriguez, Alejandro, 1O

Coupland, Jeremy, 07

Cox, Brittany, 1H

de Groot, Peter, 0X

de Oliveira, Bernardo C. F., 2N, 2U

Deck, Leslie, 0X

Denisov, D. G., 3Z

Domken, I., 1D

Dong, Liquan, 3B

Dong, Xingchen, 1P, 1S

Drozdova, Daria A., 2Y

Druzhin, Vladislav, 4C

Dubrov, A. V., 32, 33

Dubrov, V. D., 32, 33

Dziubecka, Helena, 03, 05

Eberl, C., 0V

Eckmann, S., 0V

Egorov, D. I., 36

Ehret, Gerd, 2D

Eifler, Matthias, 0Y, 23

Endo, Katsuyoshi, 0D

Ermacora, Denis, 24

Essameldin, Mahmoud, 1N

Fan, Chen, 46

Fang, Meiqi, 2C

Fantin, Analucia V., 0H, 21

Faulhaber, Andreas, 13

Fischer, B., 22

Fleischmann, Friedrich, 1N

Flury, Manuel, 0R

Fontanot, Tommaso, 24

Ford, Helen D., 10

Francis, Daniel, 10

Freischlad, Klaus, 0A

Fröhlich, Herberth B., 2N

Fröhlich, Thomas, 0L

Frommknecht, Andreas, 1Y

Fu, Peng, 43

Fukuda, Hiroshi, 2R

Funamizu, Hideki, 3G

Furukawa, Hideaki, 44

Füßl, Roland, 0L

Garcia-Armenta, Jorge, 07

Gavlina, Alexandra E., 3T

Georges, M., 0G, 0I

Gerhardt, Nils C., 2I

Ghim, Young-Sik, 31

Ghosh, A., 47

Gibson, Sam J., 0K

Giessen, Harald, 0M

Glanz, Carsten, 1Y

Glaser, Tilman, 1C

Głomb, Grzegorz, 3S, 3X

Glukhov, Yuriy, 29

Gorevoy, Alexey V., 2W

Granados-Agustin, Fermín Salomón, 1O

Gritsuta, A. N., 3D

Gronle, Marc, 13

Gröschl, Andreas C., 0N

Grosse, C. U., 22

Groves, Roger M., 0J

Gu, Feifei, 3M

Guo, Dongming, 2B

Hæggström, Edward, 0Q, 0S

Hagemeier, Sebastian, 3I

Haist, Tobias, 13

Hallam, Jonathan M., 10

Han, S.-H., 3J

Harsch, Antonia, 1G

Hartmann, P., 1T, 25

Hashimoto, Kota, 0D

Hashimoto, Takahiro, 44

Hausotte, Tino, 0N, 16

He, Huayang, 3L

He, Wenqi, 28

Heist, Stefan, 15, 17

Henning, Thomas, 1N

Hering, Julian, 0Y

Herkommer, Alois, 0M

Higuchi, Masato, 0F

Hilbig, David, 1N

Hofmann, Martin, 37

Hofmann, Martin R., 2I

Holz, Philipp, 1X

Horsten, R. C., 1A

Hošek, J., 2Z

Hoshikawa, Masaharu, 44

Hou, Qingkai, 2S, 3U

Hu, Fei, 43

Hu, Guohang, 3H

Hu, Yan, 43

Huang, Ming, 27, 2G

Huber, Franz J. T., 1U

Hui, Mei, 3B

Hurník, Jakub, 35

Ishii, Katsuhiro, 44

Ishikawa, T., 3R

Ivanov, Branimir, 2E

Jacobs, J., 1D

Jakobi, Martin, 1S, 3O

Järvinen, M., 0S

Jha, Sunil, 4B

Jia, Pingping, 2C

Jiang, Hongzhi, 3N

Jin, Jonghan, 04, 1R

Kabardiadi-Virkovski, A., 1T, 25

Kahl, Michael, 1Z

Kaidarakova, Victoria, 4C

Kang, J.-W., 42

Kang, Jungmin, 0D

Karar, Vinod, 4B

Karatas, Abdullah, 23

Kassamakov, Ivan, 0Q, 0S

Kästner, Markus, 14

Kazakov, Vasily I., 3A, 3W

Khan, Gufran S., 47, 4B

Khokhlov, Demid D., 2W

Kienle, Patrick, 1P, 3O

Kihm, H., 42

Kim, S.-B., 3J

Kirchner, Johannes, 37

Kirkove, M., 0G

Kissinger, Thomas, 0C, 0E, 3K

Kitayama, Takao, 0D

Kizaki, Ryo, 0D

Koch, Alexander W., 1P, 1S, 3O

Koch, Felix, 1C

Köchert, Paul, 0L

Köhler, Michael H., 1P, 1S, 3O

Kolenov, D., 1A

Koliopoulos, Chris, 0A

Kölsch, Dorothea, 23

Konyakhin, Igor A., 2J, 2X, 39

Korotaev, Valery V., 2H, 2V

Kovalev, Michael, 29

Kowarschik, Richard, 17

Kozacki, Tomasz, 2T, 3P

Kozlowski, Peter, 20

Krasin, George, 29

Kühmstedt, Peter, 15

Kumar, Manoj, 38, 3Q

Landmann, Martin, 15

Lang, Walter, 1N

Latifi, H., 2K, 30

Lavrinov, V. V., 3D

Layh, Michael, 0M

Lecler, Sylvain, 0R

Lee, H. J., 3J

Lehmann, Peter, 0T, 2D, 3I

Leng, Zhengwei, 3L

Lequesne, C., 0I

Li, Dawei, 3H

Li, Jun, 3M

Li, Ruxin, 2M

Li, Xudong, 3N

Liao, Meihua, 28

Liao, Zaibo, 2Q

Lindlein, N., 1F

Linghu, Changxiang, 2Q, 2S

Liu, Beibei, 41

Liu, Hsiu-Wen, 11

Liu, Jing, 41

Liu, Shijie, 27, 2G

Liu, Xiaoli, 28

Lobanova, Anastasiya Y., 2Y

Lou, Zhiyuan, 2M

Lu, Qi, 27

Lukin, V. P., 3D

Lvova, Ksenia, 4C

Machikhin, Alexander S., 2W

Maconi, Göran, 0Q, 0S

Maeda, Yoshiho, 2R

Makino, Takeshi, 44

Manske, Eberhard, 0L, 11, 37

Mantel, K., 1F

Maraev, Anton A., 2H

Marbach, Sébastien, 0R

Marcellino, Guilherme C., 2U

Marcotte, S., 1D

Marquet, B., 1D

Martinez, Pol, 0W

Martinez-Carranza, Juan, 3P

Mastylo, Rostyslav, 0L

Matsuo, Shinji, 2R

Mazy, E., 1D

Mednikov, Sergey V., 2V

Meister, Andreas, 0L

Mendoza-Santoyo, Fernando, 38, 3Q

Metzner, Sebastian, 16

Meyer, Fabian, 1V

Michel, C., 1D

Mikš, A., 3V

Mikuła, Marta, 3P

Minh, Dinh B., 2H

Mishra, Vinod, 4B

Mitchell, John B., 0U

Mitrofanov, Sergey S., 40

Miura, Toru, 2R

MohanPant, Lalit, 47

Montgomery, Paul, 0R

Moreau, V., 19

Moskaletz, Oleg D., 3A, 3W

Myer, Brian, 1H

Nallar, Elif, 3O

Nassim, Abdelkrim, 38, 3Q

Nekarda, Jan F., 1V

Nekrylov, Ivan S., 2F, 2H, 2V

Neumann, M., 1T

Nguyen, Thanh-Liem, 2O

Nguyen, The Thien, 1P

Ninca, I., 0S

Noell, Wilfried, 0Z

Nogin, Anton A., 39

Nolvi, A., 0S

Notni, Gunther, 15, 18

Novák, J., 3V

Novák, P., 3V

Novikov, Denis A., 3T

Odinokov, Sergey, 29

Oh, Kwan-Jung, 2E

Ortlepp, Ingo, 0L

Osten, Wolfgang, 13, 1G, 28

Ostendorf, Andreas, 2I

Özdemir, B., 3F

Paloušek, David, 35

Pant, Kamal K., 47, 4B

Paraskun, A. S., 3W

Park, Ian S., 07

Park, Joongki, 2E

Park, Jungjae, 04, 1R

Paroni, Sara, 24

Pedrini, Giancarlo, 28

Peng, Xiang, 28

Peng, Xiaocong, 3H

Percino-Zacarías, María Elizabeth, 1O

Pereira, S. F., 1A

Perevoznikova, Anastasiia, 4C

Perrin, Stephane, 0R

Pham, Ngoc Tuan, 2F

Pinto, Tiago L. F. C., 2U

Pinzer, Bernd, 0M

Pokorný, P., 3V

Portnova, V. E., 4A

Povarov, Kirill S., 40

Prause, Korbinian, 0M

Prosovskii, O. F., 3Z

Prosovskii, Y. O., 3Z

Pruss, Christof, 0L, 13, 1G

Puder, Th., 25

Qin, Yuwei, 2C

Quentin, Lorenz, 14

Raatikainen, P., 0S

Raducci, Sebastian, 24

Rangelow, Ivo W., 37

Ranjbar-Naeini, O. R., 2K, 30

Rees, Paul C. T., 0U

Regina, D. J., 0V

Reichel, S., 3F

Reithmeier, Eduard, 14

Rhee, Hyug-Gyo, 31

Riebeling, Joerg, 2D

Rinner, Stefan J., 1Z

Roberts, Gareth Wyn, 0U

Rodrigues, Joel J. P. C., 2V

Rosenberger, Maik, 18

Rothau, S., 1F

Rudek, F., 25

Ruiz, Pablo D., 07

Rus, J., 22

Ryzhova, Victoria A., 2Y

Saetchnikov, Anton V., 2I

Sakhariyanova, Aiganym M., 39

Salehi-Moghadam, Mohammadreza, 2K

Salido-Monzú, David, 1Q

Schake, Markus, 0T

Scharf, Torald, 0Z

Schaude, Janik, 0N

Schäufele, T., 3F

Schmauder, Martin, 1Y

Schmid, Hubert, 1Z

Schmidt, Michael, 0X

Schmidt, Samuel, 23

Schmitt, Robert, 2N

Schnabel, Mike, 1C

Schober, Christian, 1G

Schütz, Jan, 20

Schwesinger, Folker, 0L

Schwider, J., 1F

Seewig, Jörg, 0Y, 23

Selin, A. A., 3D

Senn, M., 0V

Sergeeva, Maria V., 3T

Shakher, Chandra, 47

Shao, Jianda, 27, 2G, 3H

Sharshavina, K., 19

Shin, O., 3J

Simon, Sven, 13

Simonetti, Giulio, 24

Sinzinger, Stefan, 37

Skupsch, Christoph, 48

Šmejkal, F., 3V

Smirnov, N. V., 4A

Soin, E. L., 3D

Song, W., 3J

Song, Zhan, 3M

Söylemez, H., 3F

Stankic, D., 3F

Stark, Andreas, 17

Stockman, Y., 1D

Stoykova, Elena, 2E

Ströer, Felix, 0Y

Stsepuro, Nikita, 29

Styk, Adam, 03, 05

Su, Jinlong, 43

Su, Wenying, 3L

Supreeti, Shraddha, 37

Suski, Damian, 2T

Świrniak, Grzegorz, 3S, 3X

Tahmasebi, M. M., 30

Takamasu, Kiyoshi, 0D

Tang, Qiyong, 2Q

Tatam, Ralph P., 0C, 0E, 0K, 10, 3K

Taudt, Ch., 25

Thiele, Simon, 0M

Timofeev, Alexander N., 2F, 2V

Tong, Minh Hoa, 2J

Tounsi, Yassine, 38, 3Q

Toyoshi, Yui, 0D

Tu, Han-Yen, 06

Uozumi, Jun, 3G

Vaganov, Mikhail A., 3A, 3W

Vainikka, T., 0Q, 0S

Vandenrijt, J.-F., 0G, 0I

Vasilev, Gleb, 2X

Vasileva, Anna V., 2H

Ventura, Luiz G. M., 48

Vesselli, Erik, 24

Villalobos-Mendoza, Brenda, 1O

Viotti, Matias R., 49

Voelkel, Reinhard, 0Z

von Freymann, Georg, 0Y

Wada, Naoya, 44

Wang, Fuyin, 2S, 3U

Wang, Shenghao, 2G

Wang, YiQi, 2B

Wang, Yunfan, 3N

Wei, Dong, 0F

Weidenfeller, Laura, 37

Wieser, Andreas, 1Q

Will, Stefan, 1U

Willemann, Daniel P., 0H, 21

Winarno, Agustinus, 0D

Winkler, Y., 1T

Winnik, Julianna, 2T

Wiseman, Kieran B., 0C

Wolschke, Steffen, 48

Wong, Eugene, 17

Wu, Hongfei, 43

Wu, Jiaqi, 2M

Wu, Zhouling, 27, 2G

Xiong, H., 0I

Xiong, Shuidong, 2Q, 2S, 3U

Xu, Pei, 3M

Xu, Xueke, 27

Xu, Yang, 3N

Xu, Zhizhan, 2M

Yamamura, Kazuya, 0D

Yan, Ying, 2B

Yang, H.-S., 42

Yao, Qiong, 2S, 3U

Yaryshev, Sergey N., 2H

Ylitalo, T., 0S

Yokota, M., 3R

Zatocilová, Aneta, 35

Zavalov, Y. N., 32, 33

Zeng, Zhinan, 2M

Zhang, Chen, 18

Zhang, Hangying, 46

Zhang, Jinning, 3L

Zhang, Long, 3H

Zhang, Lu, 3B

Zhang, Luyao, 2M

Zhang, Weihua, 2Q

Zhao, Hong, 2C, 46

Zhao, Huijie, 3N

Zhao, Jinlei, 2C, 46

Zhao, Juan, 3M

Zhao, Linjie, 2B

Zhao, Weirui, 3B

Zhao, Y., 0G

Zhao, Yuan’an, 3H

Zhao, Yuejin, 3B

Zhao, Zixin, 46

Zheng, Yinghui, 2M

Zhou, Guoqing, 41

Zhou, Ping, 2B

Zhou, Yishu, 3L

Zhou, You, 27

Zilk, Matthias, 1C

Ziolek, Carsten, 1Z

Conference Committee

Symposium Chairs

  • Marc P. Georges, Université de Liège (Belgium)

  • Jörg Seewig, Technische Universität Kaiserslautern (Germany)

Conference Chair

  • Peter Lehmann, Universität Kassel (Germany)

Conference CoChairs

  • Wolfgang Osten, Universität Stuttgart (Germany)

  • Armando Albertazzi Gonçalves Jr., Universidade Federal de Santa Catarina (Brazil)

Conference Programme Committee

  • Oleg V. Angelsky, Yuriy Fedkovych Chernivtsi National University (Ukraine)

  • Anand Krishna Asundi, Nanyang Technological University (Singapore)

  • Partha P. Banerjee, University of Dayton (United States)

  • Ralf B. Bergmann, Bremer Institut für angewandte Strahltechnik GmbH (Germany)

  • Harald Bosse, Physikalisch-Technische Bundesanstalt (Germany)

  • Jan Burke, Fraunhofer-Institut für Optronik, Systemtechnik und Bildauswertung (Germany)

  • Chau-Jern Cheng, National Taiwan Normal University (Taiwan)

  • Jürgen W. Czarske, Technische Universität Dresden (Germany)

  • Peter J. de Groot, Zygo Corporation (United States)

  • Chris J. Evans, The University of North Carolina at Charlotte (United States)

  • Pietro Ferraro, CNR-Institute of Applied Sciences and Intelligent Systems “Eduardo Caianiello” (Italy)

  • Andreas Fischer, Bremer Institut für Messtechnik, Automatisierung und Qualitätswissenschaft (BIMAQ) (Germany)

  • Cosme Furlong, Worcester Polytechnic Institute (United States)

  • Marc P. Georges, Université de Liège (Belgium)

  • Christophe Gorecki, FEMTO-ST (France)

  • Sen Han, University of Shanghai for Science and Technology (China)

  • Yoshio Hayasaki, Utsunomiya University (Japan)

  • Xiangqian Jiang, University of Huddersfield (United Kingdom)

  • Myung K. Kim, University of South Florida (United States)

  • Tomasz Kozacki, Warsaw University of Technology (Poland)

  • Richard K. Leach, The University of Nottingham (United Kingdom)

  • Eberhard Manske, Technische Universität Ilmenau (Germany)

  • Andrew John Moore, Heriot-Watt University (United Kingdom)

  • Gunther Notni, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)

  • Yukitoshi Otani, Utsunomiya University (Japan)

  • Xiang Peng, Shenzhen University (China)

  • Pascal Picart, Université du Maine (France)

  • Christian Rembe, Technische Universität Clausthal (Germany)

  • Robert Schmitt, RWTH (Germany)

  • Jörg Seewig, Technische Universität Kaiserslautern (Germany)

  • Cristina Trillo, Universidade de Vigo (Spain)

  • Rainer Tutsch, Technische Universität Braunschweig (Germany)

  • Eriko Watanabe, The University of Electro-Communications (Japan)

  • Toyohiko Yatagai, Utsunomiya University (Japan)

  • Changhe Zhou, Shanghai Institute of Optics and Fine Mechanics (China)

Session Chairs

  • 1 Interferometry I

    Peter Lehmann, Universität Kassel (Germany)

    Wolfgang Osten, Institut für Technische Optik (Germany)

  • 2 Digital Holography

    Pietro Ferraro, Istituto di Scienze Applicate e Sistemi Intelligenti “Eduardo Caianiello” (Italy)

  • 3 Interferometry II

    Ralf B. Bergmann, Bremer Institut für angewandte Strahltechnik GmbH (Germany)

  • 4 Speckle and Shearing Interferometry

    Marc P. Georges, Université de Liège (Belgium)

  • 5 Topography Sensors and Measuring Systems

    Jörg Seewig, Technische Universität Kaiserslautern (Germany)

  • 6 Resolution Enhancement Techniques

    Eberhard Manske, Technische Universität Ilmenau (Germany)

  • 7 High-speed Techniques

    Peter J. De Groot, Zygo Corporation (United States)

  • 8 3D Microscopy

    Paul Montgomery, Laboratoire des sciences de l’Ingénieur, de l’Informatique et de l’Imagerie (France)

  • 9 Structured Illumination Techniques I

    Gunther Notni, Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF (Germany)

  • 10 Structured Illumination Techniques II

    Jan Burke, Fraunhofer-Institut für Optronik, Systemtechnik und Bildauswertung IOSB (Germany)

  • 11 Light Scattering Techniques

    Jürgen W. Czarske, Technische Universität Dresden (Germany)

  • 12 Measurement of Optical Components I: Asphere and Freeforom Measurement. Joint Session with EOS

    Oliver W. Fähnle, FISBA AG (Switzerland)

    Sven Schröder, Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF (Germany)

  • 13 Measurement of Optical Components II

    Wolfgang Osten, Institut für Technische Optik (Germany)

  • 14 Hyperspectral Imaging and Spectroscopic Techniques

    Peter Lehmann, Universität Kassel (Germany)

  • 15 In-process and In-situ Measurements

    Xiang Peng, Shenzhen University (China)

  • 16 Nondestructive Testing and Fault Detection

    Armando Albertazzi Gonçalves Jr., Universidade Federal de Santa Catarina (Brazil)

Introduction

Compared to many other conferences the “Optical metrology systems for industrial inspection XI” has a long and successful tradition of bringing together scientists from academia and industry exchanging their knowledge and discussing new trends, applications and developments in optical metrology. This year the conference takes place for the eleventh time, meaning that the first conference was held already 20 years ago. Until today, this event is an essential part of the biannual Munich SPIE symposium “Optical Metrology” and the “LASER Word of Photonics Congress” at all.

As before, applications of optical metrology in nearly all relevant fields of industrial production will be covered, ranging from high-precision techniques and resolution enhancement to novel measurement systems that may be used in industrial production lines. This impressively demonstrates that the acquisition of knowledge based on reliable measurement data is one of the most important prerequisites to stimulate sustainable progress in industrial manufacturing.

However, the trend towards optical metrology is also driven by an increasing use of optical components and systems such as cameras, light sources, and computing power in consumer electronics products and applications. This helps optical metrology to profit from recent developments and to hold its position as one of the most dynamic fields of measurement technology, dedicated to acquire relevant data effectively in order to control, assess, and improve industrial products and processes.

Again, the Munich conference provides an excellent forum of international scientific exchange and discussion of the latest results. More than 160 submissions impressively demonstrate that, even after 20 years, the industrial inspection conference series remains a remarkable event for researchers working in optical metrology all over the world. With 77 oral presentations and more than 80 posters the 2019 conference could hold, at same time, the high number and the outstanding level of contributions which builds the basis of its long-term success.

As in previous years, a significant number of submissions deals with optical measurement of geometrical features. A field of application of maintaining interest is the measurement of optical components, e.g. aspheres, free-form surfaces, and optical systems. Therefore, the traditional joint sessions with the EOS Conference on Manufacturing and Testing of Optical Components will be continued. Since spectroscopic applications still are of growing interest for the acquisition of multimodal data even in industrial inspection, a session “Hyperspectral Imaging and Spectroscopic Techniques” was added this year.

Also the invited talks of the conference should be highlighted. Special thanks are due to the distinguished invited speakers, namely Peter de Groot (Zygo), Eberhard Manske (TU Ilmenau), Bernd Bodermann (PTB), Jan Burke (Fraunhofer IOSB), and Rainer Schuhmann (Berliner Glas) for their stimulating lectures.

We would like to express our sincere gratitude also to the members of the program committee for their support of the conference. Additionally, many thanks are due to the SPIE staff for their professional and cooperative work during the conference organization and the preparation of this proceedings volume.

Finally, we would like to thank all authors, who not only fill the conference with life but give added value to the community by contributing to this proceedings volume.

Peter Lehmann

Wolfgang Osten

Armando Albertazzi Gonçalves Jr.

© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 11056", Proc. SPIE 11056, Optical Measurement Systems for Industrial Inspection XI, 1105601 (8 August 2019); https://doi.org/10.1117/12.2539839
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KEYWORDS
Imaging systems

Interferometry

Freeform optics

Thermography

Multichannel imaging systems

Optical testing

3D image processing

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