You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
21 June 2019Absolute distance measurement of optical path length of non-contact three-dimensional nanoprofiler based on normal vector tracing method by tandem white-light interferometer
The need for freeform measurement with sub-nanometer precision is increasing with the demand for freeform optics with only single nanometer or less of figure error and surface roughness in numerous fields. Since there are no method to meet the demand, therefore we developed a non-contact three-dimensional nanoprofiler based on normal vector tracing method with the light straightness and absolute-calibrated goniometers as core concepts. The nanoprofiler achieved the sub-nanometer repeatability at the figure measurement of spherical, aspherical, cylindrical, and patterned-flat mirror. However, our numerical analysis about the systematic errors of nanoprofiler revealed that the mismatch between the recognized and the actual optical path length L, the distance between the detector and the sample in nanoprofiler, causes the assembly and motion errors such as the second-order aberration. Therefore, we developed a tandem white light interferometer which references a high-precision linear encoder as a standard of displacement, in order to measure the physical distance of L absolutely. We expect that the second-order terms of systematic errors of nanoprofiler will be decreased below than 0.1 nm or less by measuring the absolute length of L with the uncertainty of 0.1 μm or less. The first interferometer fringe was obtained for the measuring test.
The alert did not successfully save. Please try again later.
Jungmin Kang, Takao Kitayama, Ryo Kizaki, Yui Toyoshi, Kota Hashimoto, Agustinus Winarno, Kiyoshi Takamasu, Kazuya Yamamura, Katsuyoshi Endo, "Absolute distance measurement of optical path length of non-contact three-dimensional nanoprofiler based on normal vector tracing method by tandem white-light interferometer," Proc. SPIE 11056, Optical Measurement Systems for Industrial Inspection XI, 110560D (21 June 2019); https://doi.org/10.1117/12.2525071