Vectorial modeling for the image formation of a high-numerical-aperture Mueller-matrix ellipsometer

Cai Wang; Chao Chen; Xiuguo Chen; Shiyuan Liu

doi:10.1117/12.2525944

21 June 2019 Vectorial modeling for the image formation of a high-numerical-aperture Mueller-matrix ellipsometer

Cai Wang, Chao Chen, Xiuguo Chen, Shiyuan Liu

Proceedings Volume 11057, Modeling Aspects in Optical Metrology VII; 110570Q (2019) https://doi.org/10.1117/12.2525944
Event: SPIE Optical Metrology, 2019, Munich, Germany

Abstract

We have recently developed a high-numerical-aperture (high-NA) Mueller-matrix ellipsometer (MME). By adopting a high-NA objective lens, the scattered light can be collected and the image with high lateral resolution is acquired to obtain the spatially resolved Mueller matrix of the sample. In this manuscript, we propose a model of the image formation of the high-NA MME based on the rigorous coupled-wave analysis (RCWA) and vector diffraction theory. The proposed imaging formation model consists of four parts: scattering on the sample, collecting by the optical system, propagating in the optical system, and imaging on the image plane. Each part can be modeled and calculated separately. Utilizing the proposed model, we have performed a numerical simulation for two types of gratings. The results reveal the potential of the proposed model in predicting the measured Mueller matrix and analyzing the sensitivity of the high-NA MME to different nanostructures.

Conference Presentation

Citation Download Citation

Cai Wang, Chao Chen, Xiuguo Chen, and Shiyuan Liu "Vectorial modeling for the image formation of a high-numerical-aperture Mueller-matrix ellipsometer", Proc. SPIE 11057, Modeling Aspects in Optical Metrology VII, 110570Q (21 June 2019); https://doi.org/10.1117/12.2525944

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