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8 July 2019 Correlation between the structure and laser damage properties of ion assisted HfO2 thin films
Feng Pan, Yaowei Wei, Fei Zhang, Hao Liu
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Proceedings Volume 11064, Tenth International Conference on Thin Film Physics and Applications (TFPA 2019); 110640L (2019) https://doi.org/10.1117/12.2537175
Event: Pacific Rim Laser Damage 2019 and Thin Film Physics and Applications 2019, 2019, Qingdao, China
Abstract
HfO2 thin films were evaporated with ion beam assistance to achieve dense, homogeneous, stoichiometric and low-stress films. The ion beam energy were related to the optical and structural properties of the film. The absorption coefficient and the refractive index were measured by spectrophotometric technique while the microstructure has been studied by means of x-ray diffraction and atomic force microscopy. The correlation between the structure, optical properties and laser damage threshold were analyzed. The results suggest the HfO2 structure and laser damage properties are closely related to the momentum transfer process during film deposition.
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Feng Pan, Yaowei Wei, Fei Zhang, and Hao Liu "Correlation between the structure and laser damage properties of ion assisted HfO2 thin films", Proc. SPIE 11064, Tenth International Conference on Thin Film Physics and Applications (TFPA 2019), 110640L (8 July 2019); https://doi.org/10.1117/12.2537175
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KEYWORDS
Thin films
Refractive index
Absorption
Laser induced damage
Optical properties
Laser damage threshold
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