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8 July 2019 Annealing effects on the optical and structural properties of Y2O3 thin films deposited by thermal evaporation technique
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Proceedings Volume 11064, Tenth International Conference on Thin Film Physics and Applications (TFPA 2019); 1106415 (2019) https://doi.org/10.1117/12.2539549
Event: Pacific Rim Laser Damage 2019 and Thin Film Physics and Applications 2019, 2019, Qingdao, China
Abstract
Yttrium oxide (Y2O3) thin films has been prepared on glass substrates at room temperature by thermal evaporation technique using Y2O3 powders (99% purity) and then are annealed at different temperatures ranging from 150℃ to 450℃ for 24 hours in air. The effects of the annealing temperatures on the structural and optical properties of the Y2O3 thin films were studied. The results show that the refractive index, extinction coefficient and forbidden band width of the Y2O3 thin film change to different degrees with the increase of annealing temperature. In addition, the roughness and stress of the Y2O3 thin film showed a trend of increasing first and then decreasing. The crystal state of the film is improved, indicating that the grain size becomes large. The research indicates that annealing treatment can effectively change the optical properties and structural properties of the Y2O3 thin films which has guiding significance for the selection of optimal heat treatment temperature for Y2O3 film modification.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shida Li, Huasong Liu, Yugang Jiang, Meiping Zhu, Dan Chen, Xiao Yang, Lishuan Wang, Jiahuan He, and Dongbai Xue "Annealing effects on the optical and structural properties of Y2O3 thin films deposited by thermal evaporation technique", Proc. SPIE 11064, Tenth International Conference on Thin Film Physics and Applications (TFPA 2019), 1106415 (8 July 2019); https://doi.org/10.1117/12.2539549
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