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10 May 2019 The in-situ laser induced damage test of fused silica optics with different HF etching depth
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Proceedings Volume 11068, Second Symposium on Novel Technology of X-Ray Imaging; 110681D (2019) https://doi.org/10.1117/12.2524489
Event: Second Symposium on Novel Technology of X-Ray Imaging, 2018, Hefei, China
Abstract
The in-situ monitoring of subsurface defects and laser damages initiation using high resolution on-line microscope is performed on medium aperture fused silica optics manufactured by different procedures to investigate the specific damage precursors. The digital camera, Nomarski microscope and white light interferometer are used to characterize the subsurface defects. With shallow HF etching depth, the laser induced damages are mostly initiated on indents or invisible defects under the fluence of 8~10 J/cm2@355nm. The laser induced damages initiated on indents is gradually decreased with the increased etching depth and the laser induced damage density is also decreased. Besides, decrease of the indents by optimizing the polishing process could also make the laser induced damage density sharply decrease. These results prove that the indents are important damage precursors and the laser induced damage performance of fused silica optics could be substantially improved by decreasing the indents or deep HF etching.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiang He Sr., Gang Wang, XuHua Gao, Heng Zhao, Chao Cai, DingYao Yan, and Ping Ma "The in-situ laser induced damage test of fused silica optics with different HF etching depth", Proc. SPIE 11068, Second Symposium on Novel Technology of X-Ray Imaging, 110681D (10 May 2019); https://doi.org/10.1117/12.2524489
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