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9 September 2019 III-nitride emitters and detectors for UV optoelectronic applications grown by metalorganic chemical vapor deposition
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Abstract
We report the current progress of our development of near-ultraviolet (NUV) III-nitride vertical-cavity LED emitters and avalanche photodetectors grown by metalorganic chemical vapor deposition (MOCVD). The III-N emitters are designed to be UV vertical-cavity surface-emitting lasers operating at 369.5nm. We describe the development of the growth and processing of an air-gap/AlGaN distributed Bragg reflector (DBR) consisting of five-pairs of quarter-wavelength layers of Al0.12Ga0.88N and air-gap regions created by selective chemical etching. A 4-6λ cavity was employed in the laser structure. We also report on the electrical and optical emission characteristics of these microcavity emitters. The photodetectors are GaN- and AlGaN-based p-i-n avalanche photodiodes (APDs) designed for front-side illumination. We report on the electrical and optical detection characteristics of these photodetectors.
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Russell D. Dupuis, Theeradetch Detchprohm, Hi-Hee Ji, Marzieh Bakhtiary-Noodeh, Hoon Jeong, Ping Chen, Shyh-Chiang Shen, Chuan-Wei Tsou, Karan Mehta, and P. Douglas Yoder "III-nitride emitters and detectors for UV optoelectronic applications grown by metalorganic chemical vapor deposition", Proc. SPIE 11086, UV and Higher Energy Photonics: From Materials to Applications 2019, 110860C (9 September 2019); https://doi.org/10.1117/12.2540048
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