UV illumination for electron and ion beam microscopy and nanofabrication

Soon Hock Ng; Gediminas Seniutinas; Meguya Ryu; Tomas Katkus; Nguyen Hoai An Le; Paul Stoddart; Junko Morikawa; Saulius Juodkazis

doi:10.1117/12.2528681

9 September 2019 UV illumination for electron and ion beam microscopy and nanofabrication

Soon Hock Ng, Gediminas Seniutinas, Meguya Ryu, Tomas Katkus, Nguyen Hoai An Le, Paul Stoddart, Junko Morikawa, Saulius Juodkazis

Author Affiliations +

Proceedings Volume 11086, UV and Higher Energy Photonics: From Materials to Applications 2019; 110860U (2019) https://doi.org/10.1117/12.2528681
Event: SPIE Nanoscience + Engineering, 2019, San Diego, California, United States

Abstract

The scanning electron microscope (SEM) has become the major imaging technique of choice over many fields of science, providing resolution down to a few nanometers. To reduce surface charging, low beam currents and a few-nm-thick highly conductive metal (Au, Pt) coatings are used. The conceptual problem with the metal coating is that it conceals the sample features which it aims to reveal and the characterised samples are altered. A novel approach to control surface charging in SEM via the photoelectric effect is shown. The technique uses deep-UV co-illumination during SEM imaging. Photons of the deep-UV light have sufficient energy to liberate electrons from the sample surface reducing strong charge gradients. In addition, the method provides a new material dependent contrast modality in SEM. Deep-UV illumination also improves nanoscale 3D structuring using focused ion beam milling. Instead of the metal coating for electron/ion imaging, the newly introduced “coating by light” is introduced. Load-lock mountable sample holder with a deep-UV multiwavelength illumination is conceptualised.

Conference Presentation

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Soon Hock Ng, Gediminas Seniutinas, Meguya Ryu, Tomas Katkus, Nguyen Hoai An Le, Paul Stoddart, Junko Morikawa, and Saulius Juodkazis "UV illumination for electron and ion beam microscopy and nanofabrication", Proc. SPIE 11086, UV and Higher Energy Photonics: From Materials to Applications 2019, 110860U (9 September 2019); https://doi.org/10.1117/12.2528681

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