EUV mask feature reconstruction via phase retrieval

Paolo Ansuinelli; Wim Coene; Paul Urbach

doi:10.1117/12.2525976

3 September 2019 EUV mask feature reconstruction via phase retrieval

Paolo Ansuinelli, Wim Coene, Paul Urbach

Proceedings Volume 11089, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI; 110892F (2019) https://doi.org/10.1117/12.2525976
Event: SPIE Nanoscience + Engineering, 2019, San Diego, California, United States

Abstract

EUV lithography is the main candidate for patterning of future technology nodes. Its successful implementation depends on many aspects, among which the availability of actinic mask metrology tools able to inspect the patterned absorber in order to control and monitor the lithographic process. In this work, we perform a simulation study to assess the performance of coherent diffractive imaging (CDI) and related phase retrieval methods for the reconstruction of non-trivially shaped and a–periodic nanostructures from far field intensity data.

Citation Download Citation

Paolo Ansuinelli, Wim Coene, and Paul Urbach "EUV mask feature reconstruction via phase retrieval", Proc. SPIE 11089, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI, 110892F (3 September 2019); https://doi.org/10.1117/12.2525976

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