Tailored multiphoton polymerization for functional microstructures

Prem Prabhakaran; Cheol Woo Ha; Kwang-Sup Lee; Xiangming Cheng

doi:10.1117/12.2529977

30 August 2019 Tailored multiphoton polymerization for functional microstructures

Prem Prabhakaran, Cheol Woo Ha, Kwang-Sup Lee, Xiangming Cheng

Proceedings Volume 11098, Molecular and Nano Machines II; 110980M (2019) https://doi.org/10.1117/12.2529977
Event: SPIE Organic Photonics + Electronics, 2019, San Diego, California, United States

Abstract

In this presentation we discuss our attempts at balancing the desirable, and often mutually exclusive properties of resolution and mechanical stability with radical polymerizable photoresists in two-photon lithography (TPL). The photopolymerization dynamics at and around voxels (volume pixels) were controlled by the combined action of a co-initiator and a radical quencher added into the photoresist. In the second part of the manuscript longitudinal scanning during microfabrication is studied as a method to achieve fast fabrication of hierarchical microstructures with hexahedral unit cells.

Conference Presentation

Citation Download Citation

Prem Prabhakaran, Cheol Woo Ha, Kwang-Sup Lee, and Xiangming Cheng "Tailored multiphoton polymerization for functional microstructures", Proc. SPIE 11098, Molecular and Nano Machines II, 110980M (30 August 2019); https://doi.org/10.1117/12.2529977

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