High loading precision rotation stage design for synchrotron radiation mirror stitching measurement

Ming-Ying Hsu; Gung-Chian Yin; Chien-yu Lee; Bo-Yi Chen; Hok-Sum Fung; Shang-Wei Lin; Duan-Jen Wang; Yu-Shan Huang

doi:10.1117/12.2525563

30 August 2019 High loading precision rotation stage design for synchrotron radiation mirror stitching measurement

Ming-Ying Hsu, Gung-Chian Yin, Chien-yu Lee, Bo-Yi Chen, Hok-Sum Fung, Shang-Wei Lin, Duan-Jen Wang, Yu-Shan Huang

Proceedings Volume 11100, Optomechanical Engineering 2019; 111000H (2019) https://doi.org/10.1117/12.2525563
Event: SPIE Optical Engineering + Applications, 2019, San Diego, California, United States

Abstract

The project “High loading precision rotation stage design for synchrotron radiation mirror measurement” aims to provide an ultra-high-precision heavy-duty rotation stage and X-ray mirror interference optical measurements. Since the shape of an X-ray lens is very different from that of the general visible optical lens, the measurement system is very different from the general visible light optical measurement system. This paper describes a high-load precision rotating platform for obtaining stitching interferometer measurements for a synchrotron radiation mirror. The synchrotron radiation mirror is usually rectangular, and the length is greater than the interferometer measurement size. Therefore, for the mirror measurement, the stitching method is usually used to obtain synchrotron radiation mirror measurements. The interference measurements are obtained at different positions. In order to obtain the measurements, the center line of the interferometer must be perpendicular to the tangent of the mirror surface, so that appropriate interference fringes can be obtained. As the mirror radius becomes smaller, the interferometer rotation angle sensitivity increases. Development of the stitching interferometer high-load precision rotating platform design target requires an angle rotation resolution <10 nrad, considering the weight of the general interferometer plus the reference lens, related accessories, and safety factors is about 50 kg so that the rotating platform design load is 70 kg.

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Ming-Ying Hsu, Gung-Chian Yin, Chien-yu Lee, Bo-Yi Chen, Hok-Sum Fung, Shang-Wei Lin, Duan-Jen Wang, and Yu-Shan Huang "High loading precision rotation stage design for synchrotron radiation mirror stitching measurement", Proc. SPIE 11100, Optomechanical Engineering 2019, 111000H (30 August 2019); https://doi.org/10.1117/12.2525563

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