The linear beam concept dispenses with movable components such as scanner optics. By using a fixed line beam with ns pulse duration, a system with optimum reproducibility has been created. The functionality of the novel line beam system and the attainable layer quality are evaluated individually and form the basis for rapidly implementing the UV system in industrial applications. One application example presented in this paper is the reduction of graphene oxide for waferscale fabrication of reduced graphene oxide.
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