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9 September 2019 Highly absorptive pupil mask fabricated with black silicon
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Many of NASA’s direct imaging of exoplanet missions and projects require fabricated coronagraph masks to control scattering and diffraction of light. The designed, patterned mask intended for the coronagraphic testbeds are highly absorptive in the visible range on non-metallic regions. In this work, we employed the cryogenic etching process to fabricate black silicon (BSi) to achieve a high aspect ratio (HAR) structures with higher etch rate than conventional reactive ion etching (REI). Recent bidirectional reflectance distribution function (BRDF) measurements of uniformly etched BSi on silicon wafer show highly diffusive BSi with a specular reflective component in the orders of seven magnitudes lower than the total hemispherical reflectance when the polarized or non-polarized incident beam is used.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ron Shiri, Christine Jhabvala, Georgi Georgiev, Alyssa Barlis, Remi Soummer, Pete Petrone III, Marc Kuchner, Edward Wollack, Michael Biskach, Timo Saha, Will Zhang, and James Butler "Highly absorptive pupil mask fabricated with black silicon", Proc. SPIE 11116, Astronomical Optics: Design, Manufacture, and Test of Space and Ground Systems II, 111161H (9 September 2019);


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