A germanium charge-coupled device (CCD) offers the advantages of a silicon CCD for X-ray detection – excellent uniformity, low read noise, high energy resolution, and noiseless on-chip charge summation – while covering an even broader spectral range. Notably, a germanium CCD offers the potential for broadband X-ray sensitivity with similar or even superior energy resolution than silicon, albeit requiring lower operating temperatures (≤ 150K) to achieve sufficiently low dark noise due to the lower band gap of this material. The recent demonstration of high-quality gate dielectrics on germanium with low surface-state density and low gate leakage is foundational for realization of high-quality imaging devices on this material. Building on this advancement, MIT Lincoln Laboratory has been developing germanium CCDs for several years, with design, fabrication, and characterization of kpixel-class front-illuminated devices discussed recently. In this article, we describe plans to scale these small arrays to megapixel-class imaging devices with performance suitable for scientific applications. Specifically, we discuss our efforts to increase charge-transfer efficiency, reduce dark current, improve fabrication yield, and fabricate backside-illuminated devices with excellent sensitivity.
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