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9 September 2019 Mask optimization for 1D scanning projected fringe profilometry
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Abstract
A mask optimization algorithm is presented for the scanning projected fringe profilometry. It uses a sinusoidal pattern to illuminate the inspected object. Fringes on the inspected objects are recorded by the image sensor array. The mask optimization algorithm helps to identify the amplitude of the projected fringes. With the mask optimization, to analyze surfaces with low reflectance is possible.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nai-Jen Cheng, Chia-Yu Hsu, Yi-An Lin, and Wei-Hung Su "Mask optimization for 1D scanning projected fringe profilometry", Proc. SPIE 11123, Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications XIII, 111230W (9 September 2019); https://doi.org/10.1117/12.2530716
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