Creation of high-fluence precursors by 351-nm laser exposure on SiO2 substrates

David A. Cross; Christopher W. Carr

doi:10.1117/12.2536507

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20 November 2019 Creation of high-fluence precursors by 351-nm laser exposure on SiO₂ substrates

David A. Cross, Christopher W. Carr

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Proceedings Volume 11173, Laser-induced Damage in Optical Materials 2019; 111730X (2019) https://doi.org/10.1117/12.2536507
Event: SPIE Laser Damage, 2019, Broomfield (Boulder area), Colorado, United States

Abstract

The laser-induced damage performance of fused silica optics when exposed to 351-nm ns pulses is a limiting factor in the design and operation of most high-energy laser systems. As such, significant effort has been expended in developing laser damage testing protocols and procedures to inform laser system design and operating limits. These tests typically rely on multiple laser exposures for statistical validation. For larger aperture systems testing an area equal to that of the optical components in the system is functionally impossible requiring interrogation of sub-scale witness samples with elevated fluences. In this work, we show that, under the certain circumstances, the laser exposure used to test one location on a sample will generate additional laser-induced damage precursors in regions beyond that exposed to laser light and hence degrade the damage performance observed on subsequent exposures. In addition, we will outline the conditions under which this phenomenon occurs, as well as methods for mitigating or eliminating the effect.

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David A. Cross and Christopher W. Carr "Creation of high-fluence precursors by 351-nm laser exposure on SiO₂ substrates", Proc. SPIE 11173, Laser-induced Damage in Optical Materials 2019, 111730X (20 November 2019); https://doi.org/10.1117/12.2536507

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