CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 11175 > Article
Presentation + Paper
15 November 2019 New meter-class MRF platforms offer multiple size and capability options
Chris Maloney, Paul Dumas
Author Affiliations +
Proceedings Volume 11175, Optifab 2019; 111750Q (2019) https://doi.org/10.1117/12.2536839
Event: SPIE Optifab, 2019, Rochester, New York, United States
Abstract
For over 20 years, QED Technologies has been expanding the size and functionality of its MRF precision polishing product line. We have recently refreshed our meter-class platforms, developed a custom MRF upgrade for a customer’s existing 3-meter platform, and have begun development on a new half-meter platform. With the demand for new land, air and space-based imaging systems increasing, there is a growing need for optics with diameters larger than 8-12" (200- 300 mm). Our latest QED.NET software, pad polishing, multi-part batch polishing and our electronic fluid measuring system are just some of the new or updated capabilities integrated in our latest large-format MRF platforms. We refreshed the Q22-750P2 platform, which is optimized for plano polishing with two fixed MRF heads for fast changeover between wheel sizes. We expanded the capability of our Q22-950F polishing center, and now offer the Q22-1200 in its place. This platform can be ordered in four different configurations to meet a wide range of capability and price points. We have begun the development of the Q22-600 – a platform to fill the gap between the Q22-1200 and our Q-flex 300. In this paper we will review and contrast the capabilities of these new large-format platforms and present results to illustrate these capabilities.
Conference Presentation
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Chris Maloney and Paul Dumas "New meter-class MRF platforms offer multiple size and capability options", Proc. SPIE 11175, Optifab 2019, 111750Q (15 November 2019); https://doi.org/10.1117/12.2536839
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 9 PAGES + PRESENTATION
DOWNLOAD PAPER SAVE TO MY LIBRARY
WATCH
PRESENTATION
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Magnetorheological finishing
Polishing
Head
Imaging systems
Plano
Switches
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top