Study on measurement of Cl2 emission concentration by differential absorption spectroscopy

Jiatong Shi; Jie Guo; Xiaohong Han; Zhiwei Yu; Han Zhang

doi:10.1117/12.2537544

20 November 2019 Study on measurement of Cl₂ emission concentration by differential absorption spectroscopy

Jiatong Shi, Jie Guo, Xiaohong Han, Zhiwei Yu, Han Zhang

Proceedings Volume 11191, Advanced Sensor Systems and Applications IX; 1119111 (2019) https://doi.org/10.1117/12.2537544
Event: SPIE/COS Photonics Asia, 2019, Hangzhou, China

Abstract

An ultra-low emission Cl₂ monitoring optical system based on differential optical absorption spectroscopy has been set up. We have found through comparison experiments that UV reflection enhanced aluminum is damaged and the dielectric film mirror is intact under high concentration of Cl₂. Then verify the performance characteristics of ultralow Cl₂ emission online monitoring device. The maximum absorbance of 50ppm Cl₂ exceeds 0.1, while the 30ppm Cl₂ reaches 0.063, so the measurement range can be 0-95 mg/m³, which meets the maximum allowable emission concentration of Cl₂ required by the new regulations for detection of 65mg/m³.

Citation Download Citation

Jiatong Shi, Jie Guo, Xiaohong Han, Zhiwei Yu, and Han Zhang "Study on measurement of Cl₂ emission concentration by differential absorption spectroscopy", Proc. SPIE 11191, Advanced Sensor Systems and Applications IX, 1119111 (20 November 2019); https://doi.org/10.1117/12.2537544

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