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8 January 1990 Arsenic Doped Silica As A Passive Waveguiding Material
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Proceedings Volume 1125, Thin Films in Optics; (1990) https://doi.org/10.1117/12.961359
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France
Abstract
Arsenic doped silica glass (ASG) is a material which is well known to the electronics industry, due to its use in integrated circuit manufacture as a conformal covering for circuitry. We report here, for the first time, the use of ASG as a low loss waveguiding material. The guiding films were made by a CVD process, carried out between 400 and 450 °C. Three inch silica and thermal oxide coated silicon substrates were used. The thermal oxide layer was between 2 μm and 10 μm thick. Typical films which have been investigated were 1.5-2 μm thick and had a refractive index of about 1.51 at 632.8 nm, corresponding to an As2O3 content of approximately 10 mol%. They have also been patterned using standard photolithographic techniques. The properties of planar films and ridge waveguides will he discussed. We present results of loss measurements made by prism coupling into planar films and from end-fire launching into ridge guides. The scattered light was detected using a computer controlled camera system. Typically, we have measured a loss of 0.50 dBcm-1 with ±5% error for the lowest order TE mode in a planar film at 632.8 nm. The effects of reflow of the ASG on the measured loss of the guides will he illustrated. The potential for reducing this loss and the use of ASG as a passive waveguide material in integrated optics will also he discussed.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Steven D. Hubbard, B. James Ainslie, Stephen A. Bailey, and Graeme D. Maxwell "Arsenic Doped Silica As A Passive Waveguiding Material", Proc. SPIE 1125, Thin Films in Optics, (8 January 1990); https://doi.org/10.1117/12.961359
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