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28 February 2020 Picosecond laser source at 3.4 microns for laser material processing of polymers
Sebastian Nyga, Bernd Jungbluth, Florian Elsen, Anika Röhrig, Hans-Dieter Hoffmann
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Proceedings Volume 11259, Solid State Lasers XXIX: Technology and Devices; 112590D (2020) https://doi.org/10.1117/12.2544222
Event: SPIE LASE, 2020, San Francisco, California, United States
Abstract
We present a laser beam source with average output powers of up to 15 W and pulse energies of up to 50 μJ at a wavelength of 3.4 μm based on a frequency converted ultrashort pulse laser. The laser beam source consists of a commercially available ultrashort pulse laser with a pulse duration of 10 ps and a downstream multi-stage optical parametric frequency converter based on large-aperture PPLN crystals. Different output powers, pulse energies, conversion efficiencies and beam qualities are achieved depending on the design of the multi-stage setup. In addition, we present some results of processing experiments on different polymer films obtained with the laser beam source presented here.
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Sebastian Nyga, Bernd Jungbluth, Florian Elsen, Anika Röhrig, and Hans-Dieter Hoffmann "Picosecond laser source at 3.4 microns for laser material processing of polymers", Proc. SPIE 11259, Solid State Lasers XXIX: Technology and Devices, 112590D (28 February 2020); https://doi.org/10.1117/12.2544222
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KEYWORDS
Polymers
Laser processing
Pulsed laser operation
Laser cutting
Frequency converters
High power lasers
Mid-IR
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