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Diode chip implemented an integrated multiple-orders Electron Beam Lithography (EBL) optical confining grating, stabilizing on same wafer multiple wavelengths using a manufacturable, reliable and high yield technology. Up to three pitches, DBR-HPDLs 2.5 nm spaced have been demonstrated on same wafer with excellent uniformity of performances across the wafer and emitted wavelengths. Since the absence of any wavelength locking optical element in the collimated beam path, multiemitter module of DBRHPDL was assembled and tested in the production line using standard assembly process flow and without requiring any special alignment, as maturity demonstration of the proposed technology for mass production of wavelength stabilized high-power laser modules. |
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