Optical waveguide on silicon made by zone melting method

Uriel Hanuka; Yair Zigman; Maor Tiferet; Zeev Zalevsky; Moshe Sinvani

doi:10.1117/12.2545949

2 March 2020 Optical waveguide on silicon made by zone melting method

Uriel Hanuka, Yair Zigman, Maor Tiferet, Zeev Zalevsky, Moshe Sinvani

Proceedings Volume 11267, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXV; 1126706 (2020) https://doi.org/10.1117/12.2545949
Event: SPIE LASE, 2020, San Francisco, California, United States

Abstract

In this paper we introduce a novel method of making micro-waveguides on silicon surface by the use of the Zone Refining Method. We produce the melting zone by a laser beam focused on the surface of a doped silicon slab to create a melting spot on its surface. By moving the melt zone across the silicon sample we can write a path of higher index of refraction on the silicon. The depth and the width of the waveguide can be determined by the wavelength and the spot diameter of the laser, respectively. We demonstrate the production of 1X4 μm² channel on the silicon, by using 532 nm laser beam. This method can be applied in microelectronics for the manufacture of light waveguides on integrated optoelectronics ICs.

Citation Download Citation

Uriel Hanuka, Yair Zigman, Maor Tiferet, Zeev Zalevsky, and Moshe Sinvani "Optical waveguide on silicon made by zone melting method", Proc. SPIE 11267, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXV, 1126706 (2 March 2020); https://doi.org/10.1117/12.2545949

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