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15 April 2020 Front Matter: Volume 11268
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This PDF file contains the front matter associated with SPIE Proceedings Volume 11268 including the Title Page, Copyright information, Table of Contents, Introduction, and Conference Committee listing.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

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Author(s), “Title of Paper,” in Laser-based Micro- and Nanoprocessing XIV, edited by Udo Klotzbach, Akira Watanabe, Rainer Kling, Proceedings of SPIE Vol. 11268 (SPIE, Bellingham, WA, 2020) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510632998

ISBN: 9781510633001 (electronic)

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Abate, Antonio, 0K

Aguilar, Alfredo I., 0T

Aguilar-Morales, A. I., 0X

Ahmed, Mohammad, 1T

Alamri, Sabri, 0T, 0X, 0Z

Alberucci, A., 1A

Allegre, Olivier, 0L

Aminuzzaman, Mohammod, 17

Angulo, I., 0X

Antończak, Arkadiusz J., 1J

Arnold, Mark, 0H

Audouard, E., 1F

Auyeung, Raymond C. Y., 16

Baltrukonis, Justas, 1D, 1Y

Bassi, Andrea, 06

Beer, S., 0F

Behrens, Stephan, 1C

Biasetti, Demian, 0N

Bourtereau, A., 1F

Bragheri, Francesca, 06

Braunmüller, Falk, 1M

Brenner, A., 0P

Brosius, Alexander, 1O

Brune, J., 13

Budnicki, Aleksander, 1J

Cai, Jinguang, 17

Cardoso, J. T., 0X

Cavallini, Daniel, 22

Chalker, Paul, 0L

Charipar, Kristin M., 16

Charipar, Nicholas A., 16

Charles, A. P., 0Q

Chen, Jinn-Kuen, 0O

Cheng, Chung-Wei, 0O

Cheng, Ya, 08

Chu, Wei, 08

Cordovilla, F., 0X

de Castro Neto, Jarbas C., 22

De Silva, Anjali, 19

de Souza, Marco A. A., 22

Dearden, Geoff, 0L

Delaigue, M., 1F

Delmdahl, R., 13

Diboine, Jérémie, 1M

Ding, Hongtao, 0H

Du, Keming, 0Y

Düsing, Jan, 1G

Ebert, Robby, 0G

Edwardson, Stuart P., 0L

Ehrhardt, M., 1A

Elkaseer, A., 0Q

Engel, S., 0D

Engel, W. Dieter, 0N

Esen, Cemal, 1L

Exner, Horst, 0G

Farsari, Maria, 12

Faucon, M., 1B, 1F

Feng, Guoying, 29

Finger, J., 0P

Flamm, D., 0F

Förster, Deborah, 04

Fortuna, Franco, 24

Franke, Volker, 1C

Fu, Yangxi, 24

Furch, Federico J. A., 0N

Gao, Bingtao, 0H

García-Beltrán, A., 0X

Gertus, T., 1Y

Godoy Vilar, J. P., 18

Gooßen, Michael, 19

Góra, W. S., 18

Goto, Tetsuya, 10

Gotovski, Pavel, 1D, 1Y

Gräf, S., 0D, 0S

Grigoropoulos, Costas P., 0E, 12

Gross, H., 1A

Grossmann, D. G., 0F

Gu, Grace, 12

Guimarães, Francisco E. G., 22

Hamano, Fuminobu, 10

Han, Gyoowan, 0E

Han, Im Sik, 0U

Hand, D. P., 18

Harrison, David, 19

Hecker, S., 0F

Hellmann, Ralf, 1L

Hendow, Sami, 09

Hiroshige, Nao, 07

Ho, Janet, 0L

Hoenninger, C., 1F

Hohenstein, Bernd, 04

Hopkinson, Mark, 0U

Huerta-Murillo, D., 0X

Ikenoue, Hiroshi, 10

Imokawa, Kaname, 10

Jacquard, C., 1B

Jähnig, Theresa, 1O

Jäschke, Peter, 1G

Jenne, M., 0F

Jeong, Seongho, 0E

Jeun, Jinhong, 0E

Jian, P., 1B

Jin, Chao Yuan, 0U

Jukna, Vytautas, 1D, 1Y

Kaierle, Stefan, 1G

Kaiser, M., 0F

Kawano, Hiroyuki, 02

Kim, Heungsoo, 16

Kleiner, J., 0F

Kling, R., 1B, 1F

Klotzbach, Udo, 04, 1C

Knoblauch, Volker, 19

Koch, Jürgen, 1G

Komvopoulos, Kyriakos, 12

Kraft, Sebastian, 1H

Krupop, Benjamin, 0T

Kumkar, M., 0F

Kuntze, Thomas, 1C

Kunz, C., 0S

Kunze, Tim, 0T, 0Z

Laborie, Hugo, 1F

Labroille, G., 1B

Lammers, K., 1A

Lang, Valentin, 0K, 0T

Laporte, Gregoire, 1M

Lasagni, Andrés Fabián, 0K, 0T, 0X, 0Y, 0Z, 1O, 24

Lee, Sunwoo, 28

Lendner, Florian, 1Z

L’huillier, Johannes, 0B, 0R

Li, Qianliang, 0L

Li, Xiaolong, 08

Li, Zhaoqing, 0L

Lim, Seokkyun, 28

Lin, Zijie, 08

Liu, Yi-Hsien, 0O

Loeschner, Udo, 1H

Ma, Zhen, 12

Madelung, Aleksander, 0T

Mattos, Vicente S., 22

Mauersberger, Stefan, 1H

Meinhard, Dieter, 19

Memeo, Roberto, 06

Mermillod-Blondin, Alexandre, 0N

Michalowski, Andreas, 0B

Mincuzzi, G., 1B, 1F

Mishchik, K., 1F

Miyawaki, Atsushi, 02

Mizutani, Akira, 10

Mousavi, Ali, 1O

Müller, D., 13

Müller, F. A., 0D, 0S

Nacius, E., 1Y

Nakamura, Daisuke, 10

Namura, Kyoko, 07

Nolte, S., 0F, 1A

Nourry, S., 1B

Nyenhuis, Fabian, 0B

Ocaña, J. L., 0X

Okai, Shunsuke, 07

Orlov, Sergej, 1D, 1Y

Osbild, M., 0P

Osellame, Roberto, 06

Overmeyer, Ludger, 1G

Pabst, Linda, 0G

Paiè, Petra, 06

Pallier, G., 1B

Paolillo, Fernanda R., 22

Park, Hyeongchan, 28

Park, Minok, 0E

Pätzel, R., 13

Pereira-da-Silva, Marcelo A., 22

Perez-Leija, Armando, 0N

Perrie, Walter, 0L

Pfleging, W., 0Q

Pinel, O., 1B

Piqué, Alberto, 16

Rahman, Ashiqur, 17

Rebière, A., 1F

Richerzhagen, Bernold, 1M

Riegel, Harald, 19

Roh, Cheollae, 0E

Rösler, Mechthild, 04

Roth, Gian-Luca, 1L

Röther, L., 0P

Ryu, Kwanghyun, 28

Sala, Federico, 06

Schäfer, M., 0F

Schäfer, Mareike, 0R

Schanz, Jochen, 19

Schille, Joerg, 1H

Schmieder, Florian, 04, 1C

Schneider, Lutz, 1H

Schöps, Patrick, 1C

See, Tian Long, 18, 1T

Seifert, H. J., 0Q

Serien, Daniela, 02

Siems, M., 1A

Šlevas, P., 1Y

Soldera, Flavio, 0K

Soldera, Marcos, 0K, 0Z, 24

Solheid, J. S., 0Q

Sonntag, Frank, 04, 1C

Sradnick, Jan, 04

Steege, Tobias, 0T

Stępak, Bogusz D., 1J

Storm, Sebastian, 0Z

Ströbel, Joachim, 0Y

Sugioka, Koji, 02

Suzuki, Motofumi, 07

Szameit, A., 1A

Takahashi, Hidetomo, 09

Tang, Yue, 0L

Taschner, Patrick A., 1G

Toor, Fatima, 0H

Torchia, Gustavo, 0N

Ulcinas, Orestas, 1D, 1Y

Vangelatos, Zacharias, 12

Viertel, Tina, 0G

Voisiat, Bogdan, 0Y

Vrakking, Marc J. J., 0N

Wang, Peng, 08

Wang, Qinghua, 0H

Wang, Qiong, 0K

Wang, Wei, 24

Wang, Yun Ran, 0U

Watanabe, Akira, 17

Wenisch, C., 0D

Witting, Tobias, 0N

Wunsch, T., 0Q

Xu, Jian, 08

Xu, Jingzhou, 09

Yamaguchi, Mariko, 09

Yang, Chao, 29

Yasuoka, Fatima M. M., 22

Zhang, Haisu, 08

Zhang, Yuqin, 29

Zimmermann, F., 0F

Zryd, Amédée, 1M

Conference Committee

Symposium Chairs

  • Beat Neuenschwander, Berner Fachhochschule Technik und Informatik (Switzerland)

  • Xianfan Xu, Purdue University (United States)

Symposium Co-chairs

  • Craig B. Arnold, Princeton University (United States)

  • Takunori Taira, Institute for Molecular Science (Japan)

Program Track Chairs

  • Henry Helvajian, The Aerospace Corporation (United States)

  • Guido Hennig, Daetwyler Graphics AG (Switzerland)

Conference Chair

  • Udo Klotzbach, Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS (Germany)

Conference Co-chairs

  • Akira Watanabe, Tohoku University (Japan)

  • Rainer Kling, ALPhANOV (France)

Conference Program Committee

  • Antonio Ancona, CNR-Istituto di Fotonica e Nanotecnologie (Italy)

  • Jörn Bonse, Bundesanstalt für Materialforschung und -prüfung (Germany)

  • Ya Cheng, Shanghai Institute of Optics and Fine Mechanics (China)

  • Jiyeon Choi, University of Science and Technology (Korea, Republic of) and Korea Institute of Machinery & Materials (Korea, Republic of)

  • Francois Courvoisier, Université de Franche-Comté (France)

  • Ulrike Fuchs, asphericon GmbH (Germany)

  • Chunlei Guo, University of Rochester (United States)

  • Miguel Holgado Bolaños, Universidad Politécnica de Madrid (Spain)

  • Minghui Hong, National University of Singapore (Singapore)

  • Andrés-Fabián Lasagni, TU Dresden (Germany)

  • Yongfeng Lu, University of Nebraska-Lincoln (United States)

  • Yoshiki Nakata, Osaka University (Japan)

  • Wilhelm Pfleging, Karlsruher Institut für Technologie (Germany)

  • Ulf Quentin, TRUMPF Laser- und Systemtechnik GmbH (Germany)

  • Gert-Willem Römer, Universiteit Twente (Netherlands)

  • Razvan Stoian, Laboratoire Hubert Curien (France)

  • Koji Sugioka, RIKEN (Japan)

  • Hong-Bo Sun, Tsinghua University (China)

  • Jorma Vihinen, Tampere University of Technology (Finland)

  • Kunihiko Washio, Paradigm Laser Research Ltd. (Japan)

  • Michael J. Withford, Macquarie University (Australia)

  • Xianfan Xu, Purdue University (United States)

  • Haibin Zhang, ESI, Inc. (United States)

Session Chairs

  • 1 Microfluidics and Medical Micro Systems: Joint Session with 11235 and 11268

    Holger Becker, microfluidic ChipShop GmbH (Germany)

    Udo Klotzbach, Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS (Germany)

  • 2 Laser Micro Structuring and Processing

    Udo Klotzbach, Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS (Germany)

  • 3 Laser Micro/Nano Processing on Transparent Material I

    Akira Watanabe, Tohoku University (Japan)

  • 4 Laser Micro/Nano Processing on Transparent Material II

    Rainer Kling, ALPhANOV (France)

  • 5 Laser Micro/Nano Processing on Metal

    Kunihiko Washio, Paradigm Laser Research Ltd. (Japan)

  • 6 Large Area Micro/Nanostructuring Laser Interference Patterning I

    Andrés-Fabián Lasagni, TU Dresden (Germany)

  • 7 Large Area Micro/Nanostructuring Laser Interference Patterning II

    Yongfeng Lu, University of Nebraska-Lincoln (United States)

  • 8 Direct Write Processing Ablation and Surface Modification I

    Udo Klotzbach, Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS (Germany))

  • 9 Direct Write Processing Ablation and Surface Modification II

    Ya Cheng, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)

  • 10 Beam Shaping and Propagation for Laser Micro/Nano Processing

    Udo Klotzbach, Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS (Germany)

    Rainer Kling, ALPhANOV (France)

  • 11 High Speed Laser Beam Engineering Systems

    Wilhelm Pfleging, Karlsruher Institut für Technologie (Germany)

  • 12 Direct Write Processing Ablation and Surface Modification III

    Arkadiusz J. Antonczak, Wroclaw . Wroclaw Wroclaw University of Science and Technology (Poland)

© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 11268", Proc. SPIE 11268, Laser-based Micro- and Nanoprocessing XIV, 1126801 (15 April 2020); https://doi.org/10.1117/12.2570126
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