A glass etching technology with a HF solution and a chromium mask is presented. The technology allows the etching of semi-circular grooves as deep as 250 μm within a few microns with good surface quality. Two etched substrates can be superposed to obtain a cicular channel that can be filled with plastic to obtain a waveguide. The design of the mask permits the fabrication of guided wave plumbing platforms of light distribution, coupling and intersection circuits compatible with hard clad silica or plastic fibers. The feasability of a coupling platform is demonstrated. The technology also permits the positioning of optical fibers in front of integrated optic circuits.