21 December 1989 Applications Of Glass Etching To Guided Wave Optics
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Proceedings Volume 1128, Glasses for Optoelectronics; (1989) https://doi.org/10.1117/12.961449
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France
A glass etching technology with a HF solution and a chromium mask is presented. The technology allows the etching of semi-circular grooves as deep as 250 μm within a few microns with good surface quality. Two etched substrates can be superposed to obtain a cicular channel that can be filled with plastic to obtain a waveguide. The design of the mask permits the fabrication of guided wave plumbing platforms of light distribution, coupling and intersection circuits compatible with hard clad silica or plastic fibers. The feasability of a coupling platform is demonstrated. The technology also permits the positioning of optical fibers in front of integrated optic circuits.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. Voirin, G. Voirin, B. Scheja, B. Scheja, O. Parriaux, O. Parriaux, "Applications Of Glass Etching To Guided Wave Optics", Proc. SPIE 1128, Glasses for Optoelectronics, (21 December 1989); doi: 10.1117/12.961449; https://doi.org/10.1117/12.961449


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