Low loss TiO2 channel waveguides

I. Hegeman; M. Dijkstra; S. M. García-Blanco

doi:10.1117/12.2543003

25 February 2020 Low loss TiO₂ channel waveguides

I. Hegeman, M. Dijkstra, S. M. García-Blanco

Proceedings Volume 11283, Integrated Optics: Devices, Materials, and Technologies XXIV; 112830C (2020) https://doi.org/10.1117/12.2543003
Event: SPIE OPTO, 2020, San Francisco, California, United States

Abstract

TiO₂ is gaining interest as material for integrated photonics, due to its high refractive index, large transparency window and high non-linear refractive index. Its low phonon energy makes it attractive for the realization of active devices in the visible frequency range. In this work, we optimize different process steps of the fabrication of low loss TiO₂ channel waveguides. The TiO₂ layers are deposited by DC sputter deposition, using a mixed Ar/O₂ plasma. Removing the hysteresis in the deposition process, results in reduced propagation losses of the TiO₂ films (estimated less than 1.5 dB/cm at 632 nm wavelength). An E-beam lithography process is utilized to reduce the sidewall roughness of the waveguides. Different reactive gasses are compared to optimize the reactive ion etching recipe. BCl₃ in combination with HBr shows to be most beneficial for etching TiO₂ with high selectivity towards negative E-beam resist. A selectivity of 2.7 for TiO₂ over the E-beam resist is obtained. The performance of a TiO₂ a channel waveguide fabricated with the process before and after optimization is compared. The waveguide fabricated using the non-optimized process exhibited losses of 7.82±0.52 dB/cm at a wavelength of 632.8 nm, after applying an SiO₂ cladding. After process optimization, 5.08±0.65 dB/cm were obtained, without an SiO₂ cladding.

Citation Download Citation

I. Hegeman, M. Dijkstra, and S. M. García-Blanco "Low loss TiO₂ channel waveguides", Proc. SPIE 11283, Integrated Optics: Devices, Materials, and Technologies XXIV, 112830C (25 February 2020); https://doi.org/10.1117/12.2543003

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KEYWORDS

Etching

Waveguides

Electron beam lithography

Channel waveguides

Reactive ion etching

Cladding

Sputter deposition

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