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10 March 2020 Scalable fabrication of nano-architected materials using 3D interference lithography with metasurfaces at visible wavelengths (Conference Presentation)
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Abstract
Nano-architected materials have the potential to be adopted in several areas including photonic devices and structural materials. We present a 3D interference lithography technique with dielectric metasurfaces at visible wavelengths that allows patterning of thick epoxide films over areas on the order of 10 cm^2 with 100 nm resolution. By leveraging the ability of the metasurface to control the amplitude and phase of a wavefront, complex near-field 3D interference patterns can be designed. Pyrolysis of 3D patterned SU-8 produces a carbon-based material with sub-100 nm features and enhanced mechanical properties.
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Phillippe Pearson, Seyedeh Mahsa Kamali, Farzaneh Afshinmanesh, Luizetta Navrazhnykh, Ryan Ng, Andrei Faraon, and Julia R. Greer "Scalable fabrication of nano-architected materials using 3D interference lithography with metasurfaces at visible wavelengths (Conference Presentation)", Proc. SPIE 11289, Photonic and Phononic Properties of Engineered Nanostructures X, 112890I (10 March 2020); https://doi.org/10.1117/12.2555112
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