High-NA EUV lithography optics becomes reality

Lars Wischmeier; Paul Graeupner; Peter Kuerz; Winfried Kaiser; Jan van Schoot; Joerg Mallmann; Joost de Pee; Judon Stoeldraijer

doi:10.1117/12.2543308

23 March 2020 High-NA EUV lithography optics becomes reality

Lars Wischmeier, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Jan van Schoot, Joerg Mallmann, Joost de Pee, Judon Stoeldraijer

Author Affiliations +

Proceedings Volume 11323, Extreme Ultraviolet (EUV) Lithography XI; 1132308 (2020) https://doi.org/10.1117/12.2543308
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

For each lithography scanner the optics is a key component. While the NXE:3400 with ZEISS Starlith®3400 optics at Numerical Aperture of 0.33 is entering high-volume manufacturing in customer factories, we are developing high NA optics with a Numerical Aperture of 0.55. This optics consists of a highly flexible illumination system and a projection optics enabling single-exposure sub 8nm half-pitch resolution. In this paper, we give an overview of the progress of ZEISS High-NA EUV program where production of first mirrors and frames has already been started.

Citation Download Citation

Lars Wischmeier, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Jan van Schoot, Joerg Mallmann, Joost de Pee, and Judon Stoeldraijer "High-NA EUV lithography optics becomes reality", Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 1132308 (23 March 2020); https://doi.org/10.1117/12.2543308

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