How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive

Chris Anderson; Arnaud Allezy; Weilun Chao; Lucas Conley; Carl Cork; Will Cork; Rene Delano; Jason DePonte; Michael Dickinson; Geoff Gaines; Jeff Gamsby; Eric Gullikson; Gideon Jones; Lauren McQuade; Ryan Miyakawa; Patrick Naulleau; Seno Rekawa; Farhad Salmassi; Brandon Vollmer; Daniel Zehm; Wenhua Zhu

doi:10.1117/12.2552125

23 March 2020 How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive

Chris Anderson, Arnaud Allezy, Weilun Chao, Lucas Conley, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Lauren McQuade, Ryan Miyakawa, Patrick Naulleau, Seno Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu

Author Affiliations +

Proceedings Volume 11323, Extreme Ultraviolet (EUV) Lithography XI; 113230B (2020) https://doi.org/10.1117/12.2552125
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Vibration levels in MET5 exposures were reduced from 1.5 nm RMS to 0.8 nm RMS by tuning the vibration isolation system and removing non-compliant hardware. Frequency doubling exposures were improved by replacing the Fourier synthesis pupil scanner mirror. Focus-exposure-matrix outliers have been solved by patching a bug in the control software. 9 nm half-pitch lines and 8 nm half-pitch lines were printed in 11 nm thick MOx resist.

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Chris Anderson, Arnaud Allezy, Weilun Chao, Lucas Conley, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Lauren McQuade, Ryan Miyakawa, Patrick Naulleau, Seno Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, and Wenhua Zhu "How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive", Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113230B (23 March 2020); https://doi.org/10.1117/12.2552125

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