Optical defect inspection solution for EUV stochastics detection

Vidyasagar Anantha; Raghav Babulnath; Veikunth Kannan; Garima Sharma; Shubham Kumar; Kaushik Sah; Andrew Cross; Rahul Lakhawat; Hari Pathangi; Peter De Bisschop

doi:10.1117/12.2552452

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23 March 2020 Optical defect inspection solution for EUV stochastics detection

Vidyasagar Anantha, Raghav Babulnath, Veikunth Kannan, Garima Sharma, Shubham Kumar, Kaushik Sah, Andrew Cross, Rahul Lakhawat, Hari Pathangi, Peter De Bisschop

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Proceedings Volume 11323, Extreme Ultraviolet (EUV) Lithography XI; 113231J (2020) https://doi.org/10.1117/12.2552452
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Stochastics defect detection has been a topic of intense study by the extreme ultraviolet (EUV) patterning fraternity [1]. A large part of this initial feasibility work has been performed using electron microscope-based systems [1,2]. A limited sample area is imaged using electron microscopes and images are analyzed using offline analysis techniques [1,2]. However, to accurately quantify the stochastics failure rate, the entire area of interest needs to be inspected. Given such large area inspection requirements, automated and high throughput solutions are the need of the hour to enable stochastics quantification in HVM (high volume manufacturing). This paper demonstrates Broadband Plasma optical wafer inspection capability to capture two key defects on EUV layers a) missing contact in contact hole array patterns b) line breaks in line- space pattern.

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Vidyasagar Anantha, Raghav Babulnath, Veikunth Kannan, Garima Sharma, Shubham Kumar, Kaushik Sah, Andrew Cross, Rahul Lakhawat, Hari Pathangi, and Peter De Bisschop "Optical defect inspection solution for EUV stochastics detection", Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113231J (23 March 2020); https://doi.org/10.1117/12.2552452

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