Translator Disclaimer
Paper
23 March 2020 Development and deployment of advanced multi-beam mask writer
Author Affiliations +
Abstract
Multi-beam mask writers (MBMW) manufactured by IMS Nanofabrication have been increasingly been accepted into mainstream mask making. Over the past decade, this new class of tools has successfully transitioned from the concept, to development and finally to the production phase. Significant technical challenges specific to the architecture were encountered and overcome. Many of these challenges are related to the large image size used by this writer. In this paper, we will review the motivation to develop this new class of writers and the key technical challenges which had to be overcome to realize lithographic promise. Current status and future opportunities to improve the architecture will be discussed.
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mahesh Chandramouli, Bin Liu, Reid K. Juday, Bassam Shamoun, Yulia Korobko, Andrew T Sowers, Yoshihiro Tezuka, and Frank E. Abboud "Development and deployment of advanced multi-beam mask writer", Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113240K (23 March 2020); https://doi.org/10.1117/12.2556552
PROCEEDINGS
9 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Study of mask and wafer co design that utilizes a...
Proceedings of SPIE (October 03 2019)
If it moves, simulate it!
Proceedings of SPIE (April 23 2008)
Insertion strategy for EUV lithography
Proceedings of SPIE (March 13 2012)

Back to Top