Development and deployment of advanced multi-beam mask writer

Mahesh Chandramouli; Bin Liu; Reid K. Juday; Bassam Shamoun; Yulia Korobko; Andrew T Sowers; Yoshihiro Tezuka; Frank E. Abboud

doi:10.1117/12.2556552

Translator Disclaimer

23 March 2020 Development and deployment of advanced multi-beam mask writer

Mahesh Chandramouli, Bin Liu, Reid K. Juday, Bassam Shamoun, Yulia Korobko, Andrew T Sowers, Yoshihiro Tezuka, Frank E. Abboud

Author Affiliations +

Proceedings Volume 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020; 113240K (2020) https://doi.org/10.1117/12.2556552
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Multi-beam mask writers (MBMW) manufactured by IMS Nanofabrication have been increasingly been accepted into mainstream mask making. Over the past decade, this new class of tools has successfully transitioned from the concept, to development and finally to the production phase. Significant technical challenges specific to the architecture were encountered and overcome. Many of these challenges are related to the large image size used by this writer. In this paper, we will review the motivation to develop this new class of writers and the key technical challenges which had to be overcome to realize lithographic promise. Current status and future opportunities to improve the architecture will be discussed.

Citation Download Citation

Mahesh Chandramouli, Bin Liu, Reid K. Juday, Bassam Shamoun, Yulia Korobko, Andrew T Sowers, Yoshihiro Tezuka, and Frank E. Abboud "Development and deployment of advanced multi-beam mask writer", Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113240K (23 March 2020); https://doi.org/10.1117/12.2556552

ACCESS THE FULL ARTICLE