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24 March 2020 Software-based optimization methods for the ULTRA semiconductor maskwriter (Conference Presentation)
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Abstract
This presentation introduces the technology and capabilities of the current ULTRA mask writer by Heidelberg Instruments and explains more in detail the possibilities to enhance the performance by introducing software-based optimizations with the MASKER and BEAMER software tools introduced by Genisys GmbH. We will discuss the results for CD linearity and CD uniformity accomplished by ULTRA, the feature fidelity correction and will also look at plans for further developments.
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© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Niels Wijnaendts van Resandt and Ulrich Hofmann "Software-based optimization methods for the ULTRA semiconductor maskwriter (Conference Presentation)", Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113240O (24 March 2020); https://doi.org/10.1117/12.2552378
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