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23 March 2020 Maskless holographic schemes based on phase micromirror SLMs
M. Borisov, D. Chelubeev, V. Chernik, L. Merkushov, V. Rakhovskiy, A. Shamaev
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Proceedings Volume 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020; 113241K (2020) https://doi.org/10.1117/12.2552074
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States
Abstract
We propose a scheme of maskless holography as a base of a novel lithographic technic. Maskless schemes based on reflective SLMs with planar and non-planar layouts are considered. Several effective methods of phase hologram synthesis adapted to the layouts are also introduced. These methods are based on the holographic lithography approach and calculation algorithms that have been developed by Nanotech SWHL. The aim of the work is to find the proper scheme and SLM characteristics, e.g. micromirror size, flatness, dynamic stability, etc. The non-flat optical schemes based on array of reflective SLMs will allow to achieve high NA up to 0.9 without immersion. That investigation allows to design a photolithographic tool with high diffraction efficiency and high-end capabilities.
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M. Borisov, D. Chelubeev, V. Chernik, L. Merkushov, V. Rakhovskiy, and A. Shamaev "Maskless holographic schemes based on phase micromirror SLMs", Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113241K (23 March 2020); https://doi.org/10.1117/12.2552074
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KEYWORDS
Spatial light modulators
Photomasks
3D image reconstruction
Lithography
Micromirrors
Digital holography
Maskless lithography
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