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10 April 2020 Front Matter: Volume 11325
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This PDF file contains the front matter associated with SPIE Proceedings Volume 11325, including the Title Page, Copyright information, Table of Contents, Author and Conference Committee lists

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

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Author(s), “Title of Paper,” in Metrology, Inspection, and Process Control for Microlithography XXXIV, edited by Ofer Adan, John C. Robinson, Proceedings of SPIE Vol. 11325 (SPIE, Bellingham, WA, 2020) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510634176

ISBN: 9781510634183 (electronic)

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

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  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Abramovitz, Yaniv, 15

Adam, Kostas, 07

Adan, Ofer, 15

Adiga, Umesh, 1T, 30

Ahi, Kevin, 0G

Alix, Cheryl, 0W

Annezo, Vincent, 05

Arjavac, Jason, 1T

Avishai, Amir, 0M

Bachar, Ohad, 1Z

Backhauss, H., 1X

Bahrenberg, Lukas, 0X

Barnes, Bryan M., 1E

Barnum, Andrew, 1T

Batuk, Dmitry, 1T

Beccalli, A., 0I

Belletti, Filippo, 29

Ben-Nahum, Barak, 1H

Beral, Christophe, 28

Bevis, Christopher, 1M

Beylier, Charlotte, 05

Bhattacharyya, Kaustuve, 1J, 2L

Biedrzycki, Mark, 1T, 30

Birner, Albert, 12

Blancquaert, Yoann, 1L

Böcker, Paul, 21, 2X

Böckl, Max, 12

Bordogna, A., 0I, 2K

Bottegal, Giulio, 22, 29

Bouckou, L., 0I

Boustheen, Allwyn, 2X

Bouyssou, Régis, 05

Bowser, Aaron, 2B

Braga, M., 2K

Braun, Michaela, 12

Breton, Mary A., 0T, 14

Bringoltz, Barak, 1H

Broitman, Ariel, 1H

Brose, Sascha, 0X

Bunday, Benjamin D., 0R

Buxbaum, Alex, 0M

Cady, Nathaniel C., 02

Canestrari, P., 2K

Caplins, Benjamin W., 0A

Casfor Zapata, Maren, 1D

Chai, Yvon, 22

Chang, Jimmy, 2U

Chang, M. C., 18

Chao, Hung-Wen, 2Z

Chapon, Jean-Damien, 1K

Charley, Anne-Laure, 1M, 1T

Chen, Aiden, 0F

Chen, Albert, 1O

Chen, Chi, 0B

Chen, Chia-Hung, 2U, 2V

Chen, Gangyi, 0L

Chen, Kunyuan, 2U

Chen, Lu, 0B

Chen, Sam, 29

Chen, Xuemei, 23

Chen, Y. C., 18

Chess, J., 1F

Chew, Marko, 07

Chiaramonti, Ann N., 0A

Chien, Chester, 17

Chiu, Yen-Chan, 2Z

Choi, Dongsub, 1Z, 2E

Chou, Asei, 2U, 2V

Chou, Kevin, 0F

Corno, A., 0I, 2K

Corradi, Antonio, 06

Cross, Andrew, 28

Czerkas, S., 1X

Dabernat, Didier, 1W

Dakeshi, Koshiba, 1U

Danylyuk, Serhiy, 0X

Das, Sayantan, 0J, 24, 28

Davidescu, Ron, 15

de la Fuente Valentin, Isabel, 06

den Boef, Arie, 1J, 2L

Deng, Yunfei, 24

Dépré, Jérome, 1L

Dettoni, Florent, 1W

Diebold, Alain C., 02, 0W

Diercks, David R., 0A

Dillen, Harm, 06

Ding, Xiaoye, 0B

Dror, C., 1X

Du, Jie, 2U, 2V

Duclaux, Benjamin, 1K, 1W

Ducoté, Julien, 05

Dusa, Mircea, 1M

Duvdevani Bar, S., 1F

Ebert, Martin, 0F

Ebizuka, Yasushi, 1Q

Elia, Alex, 1H

El Kodadi, Mohamed, 21

Eller, Michael J., 2N

Fan, CongCong, 2U, 2V

Fan, Henry, 0L

Fang, Chao, 2L

Fang, Wei, 26, 27

Farchmin, Nando, 1D

Farhadzadeh, Farzad, 1J, 2L

Feng, Lei, 1M, 2H

Feng, Yaobin, 22, 2L

Fenger, Germain, 24

Ferrario, F., 0I, 2K

Fey, D., 0T

Figueiro, Thiago, 05

Fillinger, Laurent, 0C

Foca, Eugen, 0M

Frenner, K., 0V

Friedler, I., 1F

Frishman, E., 1F

Fros, Agnes, 12

Fullam, Jennifer, 0T, 14

Gao, Linfei, 2J

Gao, Xindong, 2R

Garcia Granda, Miguel, 1U

Gardin, Christian, 05

Gatefait, Maxime, 1K, 1W

Gaudestad, J., 2W

Geva, J., 1F

Ghafoori, Moein, 0X

Ghavami, Ali, 1U

Gillijns, Werner, 24

Glabisch, Sven, 0X

Gödecke, M. L., 0V

Golotsvan, Anna, 2C, 2E, 2J

Gonda, Satoshi, 0Q

Gorman, Brian P., 0A

Goto, Yasunori, 0N

Goulden, Jenny, 1M, 2H

Grauer, Yoav, 1P, 2C, 2J, 2R, 2S

Gray, Greg, 2J

Greene, Andrew, 14

Groeger, Philip, 07

Gronheid, Roel, 1P, 1X

Groos, T., 0I, 2K

Gui, Yutao, 1U

Gupta, Sheetal, 0M

Gutman, N., 1X

Gutsch, Manuela, 07

Habets, Boris, 07, 1Y

Haga, Tsugihiko, 2A

Hagen, C. W., 0Z

Hajaj, Eitan, 2R, 2S

Halder, Sandip, 0J, 15, 24, 28

Han, Carl, 1V

Han, Sangjun, 21

Han, Sixiao, 23

Hanaue, Jiro, 1Y

Hand, Sean, 0T, 14

Harel, Daniel, 15

Hastings, Simon, 1O

Hasumi, Kazuhisa, 25

Hatakeyama, Kodai, 0C

Hauptmann, Marc, 2X

Haynes, Rose Marie, 1T

He, Wallace, 2U

Heidenreich, Sebastian, 1D

Heidrich, T., 1X

Heijmerikx, Herman, 2L

Henn, Mark-Alexander, 1E

Higgins, Derek, 30

Hirai, Akiko, 0Q

Horiguchi, Naoto, 25

Hou, Xisen, 2N

Hsiao, Yi-Sing, 26

Hu, Chan-Yuan, 2Z

Hu, Kwang-Young, 2X

Hu, Xuerang, 0F

Huang, Chao-Yi, 2G

Huda, Sabil, 29

Huisman, T., 0Z

Humphris, Andrew D. L., 1M, 2H

Hwang, Chan, 06, 1J, 1U, 29

Hwang, Jung-Il, 2X

Iessi, U., 2K

Ikota, Masami, 25

Isai, Gratiela, 21

Isbester, Paul, 1H

Ishikawa, Masayoshi, 2F

Izawa, Masayuki, 2F

Izikson, Pavel, 22

Janda, Eric, 1U

Jang, Won-Jae, 1J

Jeon, Sanghuck, 1Z, 2E

Jeon, Se-Ra, 1J, 1U

Jeong, Ik-Hyun, 1Z, 2X

Jeong, Jaeseung, 06

Jia, Fei, 2L

Jiang, Liying, 14

Jin, Sophie Hyejin, 0G

Joo, In-Ho, 2X

Ju, Jae-Wuk, 2X

Jung, Jay, 21

Jung, Sun-Wook, 06

Jung, Wooyoung, 1J

Kal, Subhadeep, 0W

Kang, Chunsoo, 2E

Kang, Min-Seok, 29

Kang, Seul-Ki, 0J, 2A

Katz, Shlomit, 2C, 2E, 2J

Kawamura, Akinori, 2A

Kea, Marc, 06

Keller, Nick, 0W

Kim, Chulwoo, 1V

Kim, Hyun-Sok, 1Z, 2X

Kim, Jinsoo, 2E

Kim, Jinsun, 06, 1J

Kim, Min-Shik, 2X

Kim, Sang-Uk, 06

Kim, Taeddy, 21

Kim, YongHa, 1H

Kim, Young Chang, 07

Kim, Young-Sik, 2X

Kipferl, Wolfgang, 12

Kizu, Ryosuke, 0Q

Klebanov, G., 1F

Kline, R. Joseph, 0W

Klochkov, Dmitry, 0M

Kobayashi, Shinji, 20

Kolbe, Michael, 1D

Kong, Dexin, 14

Koo, Seung-Woo, 1Z, 2X

Korb, Thomas, 0M

Korde, Madhulika, 0W

Kris, R., 1F

Ku, Y. S., 18

Kuan, Chiyan, 0F

Kubo, Shinji, 0L

Kusnadi, Ir, 24

Kwon, Oh-Sung, 06, 1J

Lakcher, Amine, 21

Lam, Pui, 1L

Lambregts, Cees, 2X

Lapeyre, Céline, 1L

Laske, F., 1X

Laubis, Christian, 1D

Lee, Allen, 12

Lee, Do-Haeng, 29

Lee, Dohwa, 2E

Lee, Dong-Hak, 2X

Lee, Dong-Jin, 1Z, 2X

Lee, Dongyoung, 2E

Lee, Gunwoong, 21

Lee, Honggoo, 1Z, 2E

Lee, James, 06, 29

Lee, Jeongjin, 06, 1J, 1U, 29

Lee, Jeongpyo, 1Z

Lee, Jinho, 06

Lee, Jin-Woo, 06

Lee, Joungchel, 1L

Lee, Kang-Min

Lee, Kang-San, 2X

Lee, Keumsil, 0M

Lee, Po-Hsuan, 26

Lee, Sang Hoon, 30

Lee, Se-Hui, 1U

Lee, Seongjae, 2E

Lee, Seung Yoon, 06, 1J, 1U, 29

Lee, Soo-Kyung, 21

Lee, Yoon-Tae, 1U

Leewis, Christian, 29

Le-Gratiet, Bertrand, 05, 1W

Lei, Shi, 2J

Leray, Phillipe, 0J, 15, 1P, 1T

Leung, Fiona (Shuk Fan), 2C, 2J

Levi, Shimon, 15

Levin, Guy, 15

Levin, L., 1X

Levinski, V., 1X

Levy, Avi, 1H

Li, Chenyi, 34

Li, Jhen-Cyuan, 2Z

Li, Mingqi, 2N

Li, Penghao, 34

Li, Shifang, 28

Li, Shiguang, 34

Li, Xin, 23

Liao, Chun Yen, 2G

Lin, Chenxi, 1O

Lin, Chun-Hung, 2G

Liu, Chun-Han, 2Z

Liu, Haibo, 1H

Liu, Lei, 0F

Liu, Pei, 2Z

Liu, Xiaolei, 2R

Liu, Xuedong, 0F

Liu, Yi, 2B

Liu, Zephyr, 2S

Lo, C. W., 18

Lomtscher, Patrick, 1Y

Loosen, Peter, 0X

Lopez Gomez, Alberto, 07

Lorusso, Gian, 25

Luo, Xinan, 0F

Luthra, Roma, 1H

Ma, Eric, 0F

Ma, Qingcheng, 34

Ma, Yanzhong, 0B

Maassen, Martijn, 0F

Mack, Chris A., 0P

Makino, Katsushi, 1Y

Mani, Antonio, 23

Maruyama, Kotaro, 0J, 24, 2A

Mathias, Gavin, 2B

Mathijssen, Simon, 1J, 2L

May, Michael, 1L

McNamara, Elliott, 1U, 2L

Megged, Efi, 1P, 2C, 2E, 2J

Meng, Michael, 0O

Mermet, Olivier, 1K, 1W

Mi, Jian, 0L, 0O

Miaja-Avila, Luis, 0A

Micali, B., 0I

Miceli, Giacomo, 29

Michelsson, D., 1X

Millequant, Matthieu, 05

Minghetti, Blandine, 1L

Mirovoy, V., 1F

Misumi, Ichiko, 0Q

Mohtashami, Abbas, 0C

Moreau, David J., 1V

Mori, Taihei, 2A

Mosden, Aelan, 0W

Motta, L., 0I

Moussa, Alain, 1M, 1T

Mozooni, Babak, 22

Mudarikwa, L., 2H

Mustata, Ruxandra, 21

Nakazawa, Shinichi, 2A

Naot, Ira, 2S

Nath, Abhinandan, 07

Nelson, Dan, 30

Neumann, Jens Timo, 0M

Newham, Elis, 1M

Niedermeier, Franz, 12

Nikolaev, Konstantin, 1D

Nikolsky, Peter, 06

Ninomiya, Taku, 0N

Nooitgedagt, Tjitte, 22

Noot, Marc, 1J, 2L

Ockwell, D., 2H

Ohashi, Takeyoshi, 25

Okamoto, Yosuke, 24, 2A

Ong, Pek Beng, 2C, 2J

Ophir, Boaz, 1Z, 2C

Osborne, Jason, 0T, 14

Osten, W., 0V

Ostrovsky, Alain, 05

Ouchi, Masanori, 2F

Ovchinnikov, Denis, 06

Owusu-Boahen, Kwame, 1V

Oya, Masahiro, 24

Padhye, Kaustubh, 06, 1J

Parisi, P., 0I, 2K

Park, Chanha, 21, 2E

Park, Daniel, 06, 1J, 1U

Park, Jeongsu, 21

Park, Joon-Soo, 06, 1J, 1U, 29

Park, Noh-Kyoung, 29

Paskover, Yuri, 1P, 1X

Pate, Alex, 1V

Patil, Suraj, 1V

Patterson, Oliver D., 0F

Pearl, Haim, 12

Pereira, Silvania F., 2M

Pescalli, A., 2K

Petrillo, K., 0T

Petroni, Paolo, 05

Pflüger, Mika, 1D

Piacentini, P., 0I

Pichumani, Ramani, 0M

Piras, Daniele, 0C

Pishkari, Raheleh, 2X

Pistone, G., 0I

Pohlmann, U., 1X

Price, David W., 0D

Pu, Lingling, 27

Qi, Payne, 22

Qin, Huajun, 2L

Quesson, Benoit A. J., 0C

Rabinovich, Eylon, 1H

Rahman, Rizvi, 2X

Rathert, Jay, 0D

Rathore, D., 1F

Ren, Huan, 23

Ren, Weiming, 0F

Rijpstra, Manouk, 1O

Robinson, John C., 0D

Rodríguez-Ramos, J. M., 2W

Rogers, D., 1F

Rothstein, Eitan, 1H

Rubinovich, Ilya, 1H

Sah, Kaushik, 28

Saito, Haruki, 1Y

Saj, Izabela, 29

Sakai, Kei, 1Q

Salamone, M., 2K

Sanford, Norman A., 0A

Sanguinetti, Gonzalo, 22

Sarig, Lior, 15

Schiavone, Patrick, 05

Schmidt, Daniel, 0T, 14

Schneider, Loïc, 05

Scholze, Frank, 1D

Schröder, Sophia, 0X

Schubert, Thomas, 12

Schuch, Nivea, 05

Schuster, Richard, 2B

Schweikert, Emile A., 2N

Schwitzgebel, Jorg, 1V

Segers, Bart, 1U

Sejpal, Rajiv, 24

Seminato, S., 0I

Sen, Niladri, 0F

Shang, Shumay, 07, 0G

Shao, Chuanyu, 0L

Sharma, P., 0I, 2K

Shchegrov, Andrei, 1P

Shen, Longfei, 2L

Sherman, Kara, 0D

Shifrin, Michael, 1H

Shih, Alimei, 2C

Shin, Beomki, 21

Shin, Yong-Sik, 21

Shindo, Hiroyuki, 2F

Shinoda, Shinichi, 2F

Shirai, Masumi, 1Q

Shlagman, Ofer, 1H

Shumway, Jennifer, 21

Shusterman, Udi, 2C

Siaudinyte, Lauryna, 2M

Slotboom, Daan, 06

Soltwisch, Victor, 1D

Sommer, E., 1F

Song, Young-Hoon, 06

Spielberg, Hedvi, 2R

Staals, Frank, 1U

Stollenwerk, Jochen, 0X

Sturtevant, John, 07, 0G

Su, Rhys, 06

Sun, Alfonso, 1O

Sun, Wei, 0N

Sunday, Daniel F., 0W

Sung, Yun-A, 06

Susanto, William, 1O

Suzuki, Makoto, 1Q

Takahashi, Katsumasa, 1O

Tang, Tim, 1O

Tarshish, I., 1X

Tedaldi, M., 2H

Teh, Cho, 26

Tel, Wim, 06

Teomim, N., 1F

Thuijs, Koen, 06

Timoney, Padraig, 1H

Timoshkov, Vadim, 06

Tottewitz, Steven, 1Y

Toyoda, Yasutaka, 2F

Trefonas, Peter, 2N

Trujillo-Sevilla, J. M., 2W

Tsai, Kao-Tsai, 2G

Tsao, Sheng-Tsung, 2U, 2V

Tsiatmas, Anagnostis, 29

Tu, Leeming, 0L, 0O

Tu, Luise, 0L

Turovets, Igor, 1H

Ur Rehman, Samee, 1O

van Delft, Jan-Pieter, 21

van den Brink, Arno, 21

Van Den Heuvel, Dieter, 23

van der Sneppen, Lineke, 2L

van Es, Maarten H., 0C

van Kessel, L., 0Z

van Neer, Paul L. M. J., 0C

van West, Ewoud, 1U

Venselaar, Jan Jitse, 22, 29

Verkhoturov, Stanislav V., 2N

Verner, Alexander, 1Z

Verstraeten, Bert, 22

Vijayakumar, Arun, 1V

Vinken, Geert, 21

Volfman, Alon, 2R

Volkivich, Roie, 2E

Wang, Amy, 29

Wang, Chi-Hung, 2Z

Wang, Fei, 0F

Wang, Miao, 06

Wang, Sicong, 0B

Wang, W. T., 18

Wang, W., 0T

Wang, Zhe, 26

Wang, Zhigang, 1Q

Watson, B., 1F

Wei, Chih-I, 24

Wei, Jeremy (Shi-Ming), 2C, 2J

Wei, Yayi, 34

Witters, Liesbeth, 25

Woo, Jaesun, 2E

Wu, Cheng-Zhang, 2Z

Wu, Dean, 22

Wu, Jun-Sheng, 2G

Wu, Tung-Yu, 2G

Xia, YunSheng, 2U

Xiong, Felix, 0L

Xu, Jolly, 2L

Xu, Yujie, 2Z

Xuan, Pandeng, 22

Yacoby, Ran, 1H

Yahiro, Takehisa, 1Y

Yamamoto, Takuma, 0N

Yamazaki, Yuichiro, 0J, 24, 2A

Yang, Eun-Ji, 29

Yang, Le, 0B

Yang, Ran-Fu, 2Z

Yang, Richer, 2U, 2V

Yang, Seung-Bin, 1J, 1U

Yea, Sunyoung, 06

Yeh, C. L., 18

Yap, Judith, 2C

Yerushalmi, Liran, 1P, 1X, 1Z, 2C

Yim, Inbeom, 1U

Yin, Lianghong, 07, 0G

Yin, Weihua, 0F

Yin, Yuxiang, 06

Yohanan, Raviv, 2R, 2S

You, Huanian, 22

Yu, Hyun-Woo, 06

Yu, Lan, 14

Yu, Liangjiang, 27

Yueh, Jenny, 1U

Yumiba, Ryo, 2F

Zandiatashbar, Ardavan, 17

Zayed, Ahmed, 21

Zhang, Jian, 2C

Zhang, Jing, 34

Zhang, JunJun, 2U

Zhang, Leslie, 2U

Zhang, Linmiao, 1O

Zhang, Long, 0L

Zhang, Yu, 2Z

Zhao, Haoyuan, 34

Zhao, Pushe, 0N

Zhao, Shuo, 0F

Zhong, Zhijian, 34

Zhou, Wayne (Wei), 2J

Zhou, Wentian, 27

Zhou, Wenzhan, 2Z

Zhou, Yi, 0B, 0L, 0O

Zolkin, Marina, 1H

Zou, Xi, 0O

Zou, Yi, 1O

Conference Committee

Symposium Chairs

  • Will Conley, Cymer, LLC (United States)

  • Kafai Lai, IBM Thomas J. Watson Research Center (United States)

Conference Chair

  • Ofer Adan, Applied Materials (Israel)

Conference Co-chair

  • John C. Robinson, KLA Corporation (United States)

Conference Program Committee

  • John A. Allgair, BRIDG (United States)

  • Masafumi Asano, Tokyo Electron Ltd. (Japan)

  • Benjamin D. Bunday, AMAG Consulting, LLC (United States)

  • Jason P. Cain, Advanced Micro Devices, Inc. (United States)

  • Xiaomeng Chen, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan)

  • Hugo Cramer, ASML Netherlands B.V. (Netherlands)

  • Timothy F. Crimmins, Intel Corporation (United States)

  • Shunsuke Koshihara, Hitachi High-Technologies Corporation (Japan)

  • Yi-Sha Ku, Industrial Technology Research Institute (Taiwan)

  • Byoung-Ho Lee, SK hynix, Inc. (Korea, Republic of)

  • Philippe Leray, IMEC (Belgium)

  • Narender Rana, Western Digital Corporation (United States)

  • Christopher J. Raymond, Onto Innovation Inc. (United States)

  • Matthew J. Sendelbach, TEL Technology Ctr., America, LLC (United States)

  • Richard Silver, National Institute of Standards and Technology (United States)

  • Eric Solecky, GLOBALFOUNDRIES Inc. (United States)

  • Alexander Starikov, I&I Consulting (United States)

  • Alok Vaid, GLOBALFOUNDRIES Inc. (United States)

Session Chairs

  • 1 Keynote Session

    Ofer Adan, Applied Materials Israel, Ltd. (Israel)

    John C. Robinson, KLA Corporation (United States)

  • 2 Pattern Placement and Overlay Metrology I

    Alexander Starikov, I&I Consulting (United States)

    Jason P. Cain, Advanced Micro Devices, Inc. (United States)

  • 3 Challenges and New Methods

    Shunsuke Koshihara, Hitachi High-Technologies Corporation (Japan)

    Philippe Leray, imec (Belgium)

  • 4 Inspection and Mass Metrology

    Yi-Sha Ku, Industrial Technology Research Institute (Taiwan)

    Masafumi Asano, Tokyo Electron Ltd. (Japan)

  • 5 High Aspect Ratio Metrology

    Richard M. Silver, National Institute of Standards and Technology (United States)

    Hugo Cramer, ASML Netherlands B.V. (Netherlands)

  • 6 Roughness Metrology

    Masafumi Asano, Tokyo Electron Ltd. (Japan)

    Matthew J. Sendelbach, TEL Technology Ctr., America, LLC (United States)

  • 7 New Methods: Student Session

    Benjamin D. Bunday, AMAG Consulting, LLC (United States)

    Matthew J. Sendelbach, TEL Technology Ctr., America, LLC (United States)

  • 8 3D Profile and Shape Analysis

    Shunsuke Koshihara, Hitachi High-Technologies Corporation (Japan)

    Benjamin D. Bunday, AMAG Consulting, LLC (United States)

  • 9 Scatterometry

    Phillipe Leray, imec (Belgium)

    Yi-Sha Ku, Industrial Technology Research Institute (Taiwan)

  • 10 Machine Learning

    Masafumi Asano, Tokyo Electron Ltd. (Japan)

    Matthew J. Sendelbach, TEL Technology Ctr., America, LLC (United States)

  • 11 Pattern Placement and Overlay Metrology II

    Hugo Cramer, ASML Netherlands B.V. (Netherlands)

    Richard M. Silver, National Institute of Standards and Technology (United States)

  • 12 Metrology for the EUV Era

    Phillipe Leray, imec (Belgium)

    Shunsuke Koshihara, Hitachi High-Technologies Corporation (Japan)

  • 13 Pattern Placement and Overlay Metrology III

    Jason P. Cain, Advanced Micro Devices, Inc. (United States)

    John A. Allgair, BRIDG (United States)

  • 14 Late Breaking News

    Ofer Adan, Applied Materials Israel, Ltd. (Israel)

    John C. Robinson, KLA Corporation (United States)

© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 11325", Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 1132501 (10 April 2020); https://doi.org/10.1117/12.2571013
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