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24 March 2020 Characterization of defects in line/space patterns (Conference Presentation)
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Abstract
We propose a methodology for the mathematical and quantitative characterization of the deviation of rough line/space patterns from their ideal smooth shape to identify defects related to line mass and shape. The methodology is applied in real AFM images of line/space patterns while a modelling framework is elaborated for the generation of rough line/space patterns with controlled top and sidewall roughness and size variations. We also explore the consequences of the proposed methodology in the metrology of LER and its relation to 3D patterns.
Conference Presentation
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Vassilios Constantoudis, Bradley Williams, Nikolaos Kehagias, George Papavieros, Clivia M. Sotomoyor Torres, and Evangelos Gogolides "Characterization of defects in line/space patterns (Conference Presentation)", Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 113250U (24 March 2020); https://doi.org/10.1117/12.2559411
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