CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 11325 > Article
Paper
20 March 2020 A strengthen mask r-CNN method for PFA image measurement
Tung-Yu Wu, Chun Yen Liao, Chun-Hung Lin, Kao-Tsai Tsai, Jun-Sheng Wu, Chao-Yi Huang
Author Affiliations +
Proceedings Volume 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV; 113252G (2020) https://doi.org/10.1117/12.2551686
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States
Abstract
Critical dimension analysis of cross-section image with delicate accuracy has become important demand for semiconductor manufacturing. In traditional analytic method, manual measurements always accompany large deviation and lower measured efficiency. Therefore, a robust and reliable analysis method is most essential objective to obtain accurate dimensions from PFA results. In this work, we demonstrate an intelligent image analysis method which is combined Mask Region based Convolution Neural Networks (Mask r-CNN) and image processing technique. Compared with manual measurement, intelligent image analysis method can achieve significant improvement on measured results in reproducibility, repeatability, and efficiency. This intelligent image analysis will provide novel applications in CD measurement, wafer defect analysis, and focus-exposure process window judgment.
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Tung-Yu Wu, Chun Yen Liao, Chun-Hung Lin, Kao-Tsai Tsai, Jun-Sheng Wu, and Chao-Yi Huang "A strengthen mask r-CNN method for PFA image measurement", Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 113252G (20 March 2020); https://doi.org/10.1117/12.2551686
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 6 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Image processing
Image analysis
Critical dimension metrology
Convolution
Data modeling
Neural networks
Semiconducting wafers
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top