In this paper, we will describe our efforts to leverage different filtration parameters, including retention ratings and membrane materials, to understand their impact on EUV underlayer coating defects, and will present the characterization of coating defects in very thin films. |
ACCESS THE FULL ARTICLE
No SPIE Account? Create one
Extreme ultraviolet
Coating
Particles
Semiconducting wafers
Extreme ultraviolet lithography
Silicon
Photoresist materials