A novel projection lens manipulator for high frequent overlay tuning

Thilo Pollak; Wolfgang Emer; Bernd Thüring; Francis Fahrni; Friso Klinkhamer; Wim de Boeij; Wim Bouman

doi:10.1117/12.2552063

23 March 2020 A novel projection lens manipulator for high frequent overlay tuning

Thilo Pollak, Wolfgang Emer, Bernd Thüring, Francis Fahrni, Friso Klinkhamer, Wim de Boeij, Wim Bouman

Proceedings Volume 11327, Optical Microlithography XXXIII; 113270T (2020) https://doi.org/10.1117/12.2552063
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Even with the large-scale adaption of EUV Lithography to High Volume Manufacturing, numerous device-critical product layers will still be exposed with Immersion Lithography Technology and therefore ZEISS and ASML keep investing in the next generation immersion extensions. The overlay accuracy has to be controlled over the exposure field more accurately and also on a higher spatial frequency grid. To support this functionality, a novel manipulator will be incorporated into the next generation of immersion optics, which is especially well-suited for high frequent distortion tuning. Furthermore, lens distortion measurements and adjustments will be done based on more field points. In this paper, we will show the unique correction functionality of this manipulator and show its various application fields for improving the performance of ASML scanners.

Conference Presentation

Citation Download Citation

Thilo Pollak, Wolfgang Emer, Bernd Thüring, Francis Fahrni, Friso Klinkhamer, Wim de Boeij, and Wim Bouman "A novel projection lens manipulator for high frequent overlay tuning", Proc. SPIE 11327, Optical Microlithography XXXIII, 113270T (23 March 2020); https://doi.org/10.1117/12.2552063

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