Approach for lightsource utilization improvement by extending Preventive Maintenance (PM) cycle along with performance monitoring feature

Futoshi Sato; Sophia Hu; Toshihiro Oga; Taku Yamazaki

doi:10.1117/12.2551838

23 March 2020 Approach for lightsource utilization improvement by extending Preventive Maintenance (PM) cycle along with performance monitoring feature

Futoshi Sato, Sophia Hu, Toshihiro Oga, Taku Yamazaki

Author Affiliations +

Proceedings Volume 11327, Optical Microlithography XXXIII; 1132713 (2020) https://doi.org/10.1117/12.2551838
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Semiconductor demand is steadily growing which is driven by the growth of electronics market used for automobiles to finance, medical to industrial use including agriculture in the last few years. Therefore, the challenges of productivity improvement amongst semiconductor manufacturers are higher than ever. In order to meet that challenge, Gigaphoton has been developed emerging technologies to extend the module replacement interval and reduce the maintenance time along with module life extension. Furthermore, Preventive Maintenance (PM) cycle on the light source is significantly important in order to improve productivity efficiently, that’s why Gigaphoton is focusing to develop technologies for module replacement interval extension not only module base life cycle PM, takes into account PM cycle reduction As implementing new approach for effective PM event managing, Gigaphoton introduced “Availability Maximization(here in afer “AMAX”) as software solution in providing best effective tool utilization aka availability maximization solution to be provided to Semiconductor manufacturer which is operated on FABSCAPE platform. Semiconductor manufacturers are able to create PM planning in terms of both tool availability maximization and scheduled PM which can be aligned to other equipment, fab situation in order to utilize fully productivity in wafer output.

Citation Download Citation

Futoshi Sato, Sophia Hu, Toshihiro Oga, and Taku Yamazaki "Approach for lightsource utilization improvement by extending Preventive Maintenance (PM) cycle along with performance monitoring feature", Proc. SPIE 11327, Optical Microlithography XXXIII, 1132713 (23 March 2020); https://doi.org/10.1117/12.2551838

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available