26 October 1989 Single Photomask, Multilevel Kinoforms: Manufacture And Evaluation
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Proceedings Volume 1136, Holographic Optics II: Principles and Applications; (1989) https://doi.org/10.1117/12.961665
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France
Abstract
Kinoforms manufactured in photoresist with photolithographic techniques using a single, ten-level, grey-scale photomask, exposed in a specially designed laser exposure system, are described. Kinoforms designed for uniform as well as for partial Gaussian beam illumination are investigated. Measured diffraction efficiencies exceeded 50 percent.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Andersson, M. Ekberg, S. Hard, S. Jacobsson, M. Larsson, T. Nilsson, "Single Photomask, Multilevel Kinoforms: Manufacture And Evaluation", Proc. SPIE 1136, Holographic Optics II: Principles and Applications, (26 October 1989); doi: 10.1117/12.961665; https://doi.org/10.1117/12.961665
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