26 October 1989 Single Photomask, Multilevel Kinoforms: Manufacture And Evaluation
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Proceedings Volume 1136, Holographic Optics II: Principles and Applications; (1989) https://doi.org/10.1117/12.961665
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France
Abstract
Kinoforms manufactured in photoresist with photolithographic techniques using a single, ten-level, grey-scale photomask, exposed in a specially designed laser exposure system, are described. Kinoforms designed for uniform as well as for partial Gaussian beam illumination are investigated. Measured diffraction efficiencies exceeded 50 percent.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Andersson, H. Andersson, M. Ekberg, M. Ekberg, S. Hard, S. Hard, S. Jacobsson, S. Jacobsson, M. Larsson, M. Larsson, T. Nilsson, T. Nilsson, } "Single Photomask, Multilevel Kinoforms: Manufacture And Evaluation", Proc. SPIE 1136, Holographic Optics II: Principles and Applications, (26 October 1989); doi: 10.1117/12.961665; https://doi.org/10.1117/12.961665
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