11 October 1989 Design Principles For An Illumination System Using An Excimer Laser As A Light Source
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Proceedings Volume 1138, Optical Microlithography and Metrology for Microcircuit Fabrication; (1989) https://doi.org/10.1117/12.961753
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France
Abstract
Design principles for the illumination system of a DUV wafer stepper are derived by examining the coherence properties of a KrF excimer laser and the effect of DUV radiation of high energy density on fused silica, the material used for the optical components. Alternative designs are presented and discussed.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Johannes Wangler, Johannes Wangler, J. Liegel, J. Liegel, "Design Principles For An Illumination System Using An Excimer Laser As A Light Source", Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); doi: 10.1117/12.961753; https://doi.org/10.1117/12.961753
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