11 October 1989 Five Watt Industrial Lithography Excimer Laser System
Author Affiliations +
Proceedings Volume 1138, Optical Microlithography and Metrology for Microcircuit Fabrication; (1989) https://doi.org/10.1117/12.961750
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France
Abstract
The commercial Lambda Physik excimer laser model 248 L was specially designed for deep UV projection lithography. Its output power was 2 W at a pulse repetition frequency of 200 Hz. An improved version of this laser was developed and tested thoroughly. Due to modifications of the optical system and the electrical discharge, the average power could be increased to 5 W without sacrificing other specifications. The bandwidth is better than 0.003 nm (0.5 cm-1), and the wavelength is actively stabilized to ± 0.001 nm. The pulse frequency was raised to 400 Hz to comply with the demands of todays deep UV-steppers. A newly developed module allows absolute wavelength calibration within the tuning range of 248.18 to 248.58 nm. The absolute accuracy of this calibration is ± 0.001 nm. Using this option, the laser can be tuned exactly to the wavelength of best performance of the stepper optics.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Oesterlin, P. Oesterlin, P. Lokai, P. Lokai, H. Rosenkranz, H. Rosenkranz, H.-J. Kahlert, H.-J. Kahlert, D. Basting, D. Basting, } "Five Watt Industrial Lithography Excimer Laser System", Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); doi: 10.1117/12.961750; https://doi.org/10.1117/12.961750
PROCEEDINGS
3 PAGES


SHARE
Back to Top