11 October 1989 Ultra-Precise Mask Metrology - Development And Practical Results Of A New Measuring Machine
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Proceedings Volume 1138, Optical Microlithography and Metrology for Microcircuit Fabrication; (1989) https://doi.org/10.1117/12.961756
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France
Abstract
As circuits with sub-micron structures continue to increase in complexity, previous methods of inspecting overlay and CD tolerances are proven inadequate. Therefore, sponsored by the West German Ministry for Research and Technology, Wild Leitz developed a mask measurement system that represents in terms of achievable accuracy the limit of what is technically possible today. Within this project, Siemens as one of the key customers has performed part of the accuracy tests on a prototype of the machine and is now using a final system in its mask production line with good results.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Feindt, H. Feindt, D. Sofronijevic, D. Sofronijevic, } "Ultra-Precise Mask Metrology - Development And Practical Results Of A New Measuring Machine", Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); doi: 10.1117/12.961756; https://doi.org/10.1117/12.961756
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