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27 November 1989 A Repetitive Laser-Plasma X-Ray Source For Radiobiology Research
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Abstract
A KrF laser-based repetitively pulsed (5 Hz) plasma X-ray source producing photons at hυ≈0.85 keV (iron, L-shell) from a precision steel rotating target has been developed. This source has been used for exposures of several minutes duration to study soft X-ray induced cell killing and DNA damage effects in cultured Chinese hamster cells. To minimise the debris from the laser plasma source the target chamber contained helium at 300 torr with a slow flow. The biological material was exposed outside the target chamber by X-rays emerging through a beryllium vacuum window into a helium-filled beam-line. The results showed that the source was very effective at killing V79 cells and at inducing DNA damage in V79 cells but not in AA8 cells.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
F. O'Neill, I. C. E. Turcu, G. J. Tallents, J. Dickerson, T. Lindsay, D. T. Goodhead, A. Stretch, C. W. Wharton, and R. A. Meldrum "A Repetitive Laser-Plasma X-Ray Source For Radiobiology Research", Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); https://doi.org/10.1117/12.961829
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